X-Ray Nanotomography Enabling Submicron Resolution Failure Analysis for Advanced Packaging
Abstract Advanced packaging of electronic components is increasing complexity of single packages containing up to hundreds of individual components in a 3-dimensional arrangement. X-ray nano-tomography enables to resolve these complex structures in 3D with sub-micron resolution for failure analysis. Here we present a study using a cutout from an embedded multi-die interconnect bridge (EMIB) scanned with a custom nano-CT system utilizing a state-of-the-art nano focus X-ray source. For comparison, a scan using a commercial electronics imaging system was performed as well. We demonstrate that micron and sub-micron sized defects can be identified enabling failure analysis on the sub-micron level.
Authors
- Daniel Nilsson
- Julius Hållstedt
- Till Dreier (ORCID: https://orcid.org/0000-0002-6632-402X)
- J. Wittborn
Institutions
- Ericsson (Sweden) (SE)
- Excillum (Sweden) (SE)
Publication Details
- Journal
- Proceedings - International Symposium for Testing and Failure Analysis
- Published
- 2024-10-23
- DOI
- https://doi.org/10.31399/asm.cp.istfa2024p0169
- Citations
- 1
- Primary Topic
- Integrated Circuits and Semiconductor Failure Analysis
- Type
- article
- Field-Weighted Citation Impact
- 0.21