Enhancing Semiconductor Nanoprobing Procedures with AI-Driven Tip Detection
Abstract The automation of nanoprobing application relies on the accurate detection of probe tips in scanning electron microscope (SEM) images. This work explores the application of deep learning models to automate and improve this critical process. Different models such as Mask R-CNN, YOLOv8 and RTMDet, trained on a specialized dataset, are used to accurately detect, segment and localize probe tips in SEM images, even under challenging conditions. Results show that these models have the potential to improve the automation of nanoprobing workflows, particularly in automatic tip positioning and crash prevention. Future work will focus on production-level deployment and the integration of tracking algorithms.
Authors
- Andreas Zell
- Matthias Kemmler
- David Stefan Kleindiek
Institutions
- Teamtechnik (Germany) (DE)
- University of Tübingen (DE)
Publication Details
- Journal
- Proceedings - International Symposium for Testing and Failure Analysis
- Published
- 2024-10-23
- DOI
- https://doi.org/10.31399/asm.cp.istfa2024p0001
- Primary Topic
- Advanced Surface Polishing Techniques
- Type
- article
- Field-Weighted Citation Impact
- 0.00