Enhancing Semiconductor Nanoprobing Procedures with AI-Driven Tip Detection

Abstract The automation of nanoprobing application relies on the accurate detection of probe tips in scanning electron microscope (SEM) images. This work explores the application of deep learning models to automate and improve this critical process. Different models such as Mask R-CNN, YOLOv8 and RTMDet, trained on a specialized dataset, are used to accurately detect, segment and localize probe tips in SEM images, even under challenging conditions. Results show that these models have the potential to improve the automation of nanoprobing workflows, particularly in automatic tip positioning and crash prevention. Future work will focus on production-level deployment and the integration of tracking algorithms.

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Publication Details

Journal
Proceedings - International Symposium for Testing and Failure Analysis
Published
2024-10-23
DOI
https://doi.org/10.31399/asm.cp.istfa2024p0001
Primary Topic
Advanced Surface Polishing Techniques
Type
article
Field-Weighted Citation Impact
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article

Enhancing Semiconductor Nanoprobing Procedures with AI-Driven Tip Detection

Andreas Zell, Matthias Kemmler, David Stefan Kleindiek
Proceedings - International Symposium for Testing and Failure Analysis
Advanced Surface Polishing Techniques
article

Enhancing Semiconductor Nanoprobing Procedures with AI-Driven Tip Detection

Andreas Zell, Matthias Kemmler, David Stefan Kleindiek
article en

Abstract

Abstract The automation of nanoprobing application relies on the accurate detection of probe tips in scanning electron microscope (SEM) images. This work explores the application of deep learning models to automate and improve this critical process. Different models such as Mask R-CNN, YOLOv8 and RTMDet, trained on a specialized dataset, are used to accurately detect, segment and localize probe tips in SEM images, even under challenging conditions. Results show that these models have the potential to improve the automation of nanoprobing workflows, particularly in automatic tip positioning and crash prevention. Future work will focus on production-level deployment and the integration of tracking algorithms.

Proceedings - International Symposium for Testing and Failure AnalysisVol. 84918
Teamtechnik (Germany) (DE), University of Tübingen (DE)
Openalex Percentile: Top 83%
Advanced Surface Polishing Techniques
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