Application of Thermal Emission Phase Lock-In Image Statistics to Locate Defects in Z-depth for Advance 2.5D Packaging
Abstract This paper presents a novel method for determining the Z-depth location of short circuit defects in flip chip packages using lock-in thermography (LIT). The approach analyzes phase shift values from localized hot spots using the LIT system's "Image Statistics" feature, specifically focusing on phase "mean" values at specific lock-in frequencies. Through extensive testing on 2.5D stacked silicon interconnect technology (SSIT) packages exhibiting short failures, we established a strong correlation between phase mean values and the vertical location of defects. This technique's reliability was validated through both physical analysis and non-destructive verification methods, demonstrating its effectiveness as a precise diagnostic tool for complex semiconductor packages.
Authors
- Brian Lai
- P.K. Tan
- Daniel Nuez
Institutions
- Advanced Micro Devices (United States) (US)
- Thermo Fisher Scientific (United States) (US)
Publication Details
- Journal
- Proceedings - International Symposium for Testing and Failure Analysis
- Published
- 2024-10-23
- DOI
- https://doi.org/10.31399/asm.cp.istfa2024p0213
- Primary Topic
- Integrated Circuits and Semiconductor Failure Analysis
- Type
- article
- Field-Weighted Citation Impact
- 0.00