A Novel DTCO-driven 1T1R Bitcell for sub-10ns STT-MRAM LLC Macros at N12 Node

We introduce a novel 1T1R bitcell design to address the challenges posed by the high current requirement during the Parallel to Anti-Parallel (P2AP) transition in STT-MRAM. This innovative configuration enhances the entire subarray’s resistive write-path when supported by thorough design technology co-optimization (DTCO). Delivering >80% current for P2AP switching, the proposal enables larger subarray capacities while allowing for a simplified periphery and biasing framework. Our proposal overcomes a major barrier that previously hindered the write speed and delayed the adoption of STT-MRAM technology for embedded Last Level Caches (LLCs). The designed $256 x 256$ subarrays simulated in commercial N12/N22 nodes prove technology node scaling and showcase exceptional write performance, $6.6 / 9.55 {ns}$ respectively, enabling a wide range of macros (8KB-1MB) operating below 10ns.

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Published
2024-09-09
DOI
https://doi.org/10.1109/esserc62670.2024.10719478
Citations
2
Primary Topic
Advancements in Photolithography Techniques
Type
article
Field-Weighted Citation Impact
0.42
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article

A Novel DTCO-driven 1T1R Bitcell for sub-10ns STT-MRAM LLC Macros at N12 Node

Siddharth Rao, Prashant Pandey, Sébastien Couet, M. García-Bardon et al.
2 citations
Advancements in Photolithography Techniques
0.42
article

A Novel DTCO-driven 1T1R Bitcell for sub-10ns STT-MRAM LLC Macros at N12 Node

Siddharth Rao, Prashant Pandey, Sébastien Couet, M. García-Bardon, Lynn Verschueren, Dawit Burusie Abdi, Fernando Garćıa-Redondo, Geert Hellings, Pieter Weckx
article en
2 citations

Abstract

We introduce a novel 1T1R bitcell design to address the challenges posed by the high current requirement during the Parallel to Anti-Parallel (P2AP) transition in STT-MRAM. This innovative configuration enhances the entire subarray’s resistive write-path when supported by thorough design technology co-optimization (DTCO). Delivering >80% current for P2AP switching, the proposal enables larger subarray capacities while allowing for a simplified periphery and biasing framework. Our proposal overcomes a major barrier that previously hindered the write speed and delayed the adoption of STT-MRAM technology for embedded Last Level Caches (LLCs). The designed $256 x 256$ subarrays simulated in commercial N12/N22 nodes prove technology node scaling and showcase exceptional write performance, $6.6 / 9.55 {ns}$ respectively, enabling a wide range of macros (8KB-1MB) operating below 10ns.

IMEC (BE)
Openalex Percentile: Top 37%
Advancements in Photolithography Techniques
0.42
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