N2 Nanosheet Pathfinding-PDK (P-PDK<sup>TM</sup>) Including Back-Side PDN
Connecting the circuit design ecosystem to the semiconductor technology roadmap has never been more essential than it is today. With scaling limitations leading to disruptive technological innovations, profound DesignTechnology Co-Optimization and new design methodologies are required. Early Process Design Kits (PDKs) serve as fundamental tools in facilitating this pursuit. This paper introduces the imec N2 design Pathfinding PDK (P-PDK) built on imec logic roadmap experience. The N2 P-PDK features Nanosheet devices with both wafer front- and back-side power connectivity, at projected performance and within industrial process capability.
Authors
- Anita Farokhnejad
- Odysseas Zografos (ORCID: https://orcid.org/0000-0002-9998-8009)
- Amit Kumar Dutta (ORCID: https://orcid.org/0000-0002-5111-7861)
- Gioele Mirabelli (ORCID: https://orcid.org/0000-0001-7060-4836)
- Lynn Verschueren (ORCID: https://orcid.org/0000-0002-2941-769X)
- Sheng Hsiung Yang (ORCID: https://orcid.org/0000-0003-1869-3100)
- Dawit Burusie Abdi
- Siva Satyendra Sahoo (ORCID: https://orcid.org/0000-0002-2243-5350)
- Geert Hellings (ORCID: https://orcid.org/0000-0002-5376-2119)
- M. Garcia Bardon (ORCID: https://orcid.org/0000-0001-5772-5406)
- Sankatali Venkateswarlu (ORCID: https://orcid.org/0000-0002-1616-6764)
- Pieter Weckx (ORCID: https://orcid.org/0000-0003-4579-0571)
- Julien Ryckaert (ORCID: https://orcid.org/0009-0001-0140-3042)
- James Myers
- Jack Cousins
Institutions
- IMEC (BE)
Publication Details
- Published
- 2024-09-09
- DOI
- https://doi.org/10.1109/esserc62670.2024.10719536
- Citations
- 1
- Primary Topic
- Nanofabrication and Lithography Techniques
- Type
- article
- Field-Weighted Citation Impact
- 0.18