THE MODEL DEVELOPMENT FOR OPTIMIZING THE LINE EDGE ROUGHNESS IN DOUBLE PATTERNING PROCESS

In this paper, we analyzed the influence of various parameters on the line edge roughness (LER) for double patterning process and investigated the dependence of the post exposure baking (PEB) temperature on the critical dimension (CD) of lines and on the LER.

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Publication Details

Published
2024-10-20
DOI
https://doi.org/10.29003/m4272.mmmsec-2024/102-105
Primary Topic
Manufacturing Process and Optimization
Type
article
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article

THE MODEL DEVELOPMENT FOR OPTIMIZING THE LINE EDGE ROUGHNESS IN DOUBLE PATTERNING PROCESS

Елена Тихонова, Yevgeniy Gornev
Manufacturing Process and Optimization
article

THE MODEL DEVELOPMENT FOR OPTIMIZING THE LINE EDGE ROUGHNESS IN DOUBLE PATTERNING PROCESS

Елена Тихонова, Yevgeniy Gornev
article en

Abstract

In this paper, we analyzed the influence of various parameters on the line edge roughness (LER) for double patterning process and investigated the dependence of the post exposure baking (PEB) temperature on the critical dimension (CD) of lines and on the LER.

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THE MODEL DEVELOPMENT FOR OPTIMIZING THE LINE EDGE ROUGHNESS IN DOUBLE PATTERNING PROCESS — Елена Тихонова, Yevgeniy Gornev · (2024) | TGRS Research Map | TGRS