Improving the ON/OFF Current Ratio and Ambipolarity of Doping-Less Tunneling Carbon-Nanotube FET Using Drain Engineering Technique

This paper presents a novel structure utilizing a doping-less (DL) tunneling carbon nanotube field-effect transistor (T-CNTFET) with dual drain work functionality aimed at enhancing the ON/OFF current ratio. The proposed design features a zigzag carbon nanotube (CNT) of type (13, 0) with a diameter of 1 nm. It employs HfO2 as the gate oxide, which is 2 nm thick and has a dielectric constant of 16. The CNT serves as an intrinsic semiconductor for the source and drain regions, which are composed of metals with appropriate work functions. By selecting appropriate metals for the source and drain regions, the necessity for doping as a fabrication step is avoided, simplifying construction and reducing costs for the nanoscale device. This design includes two drain electrodes, each measuring 15 nm in length and having different work functions (DWFs). The work function of the drain positioned closest to the channel (DWFAC) is set at 3.9 eV, which is 0.5 eV lower than that of the CNT, while the other drain section has a work function of 3.4 eV, 1 eV lower than the CNT. The electrical properties of the device were examined through quantum numerical simulations using the non-equilibrium Green's function (NEGF) method. The results indicate that the proposed structure significantly decreases the OFF-state current and improves the ON/OFF current ratio. Additionally, the leakage current is substantially lowered, resulting in favorable changes to the device's ambipolarity, along with a reduction in hot carrier effects and subthreshold swing (SS).

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Publication Details

Journal
Journal of Electronics and Electrical Engineering
Published
2024-10-24
DOI
https://doi.org/10.37256/jeee.3220245453
Citations
1
Primary Topic
Advancements in Semiconductor Devices and Circuit Design
Type
article
Field-Weighted Citation Impact
0.21
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article

Improving the ON/OFF Current Ratio and Ambipolarity of Doping-Less Tunneling Carbon-Nanotube FET Using Drain Engineering Technique

Maryam Ghodrati, Ali Mir, Ali Naderi
1 citations
Journal of Electronics and Electrical Engineering
Advancements in Semiconductor Devices and Circuit Design
0.21
article

Improving the ON/OFF Current Ratio and Ambipolarity of Doping-Less Tunneling Carbon-Nanotube FET Using Drain Engineering Technique

Maryam Ghodrati, Ali Mir, Ali Naderi
article en
1 citations

Abstract

This paper presents a novel structure utilizing a doping-less (DL) tunneling carbon nanotube field-effect transistor (T-CNTFET) with dual drain work functionality aimed at enhancing the ON/OFF current ratio. The proposed design features a zigzag carbon nanotube (CNT) of type (13, 0) with a diameter of 1 nm. It employs HfO2 as the gate oxide, which is 2 nm thick and has a dielectric constant of 16. The CNT serves as an intrinsic semiconductor for the source and drain regions, which are composed of metals with appropriate work functions. By selecting appropriate metals for the source and drain regions, the necessity for doping as a fabrication step is avoided, simplifying construction and reducing costs for the nanoscale device. This design includes two drain electrodes, each measuring 15 nm in length and having different work functions (DWFs). The work function of the drain positioned closest to the channel (DWFAC) is set at 3.9 eV, which is 0.5 eV lower than that of the CNT, while the other drain section has a work function of 3.4 eV, 1 eV lower than the CNT. The electrical properties of the device were examined through quantum numerical simulations using the non-equilibrium Green's function (NEGF) method. The results indicate that the proposed structure significantly decreases the OFF-state current and improves the ON/OFF current ratio. Additionally, the leakage current is substantially lowered, resulting in favorable changes to the device's ambipolarity, along with a reduction in hot carrier effects and subthreshold swing (SS).

Journal of Electronics and Electrical Engineering
Lorestan University (IR), Imam Khomeini International University (IR)
Openalex Percentile: Top 47%
Advancements in Semiconductor Devices and Circuit Design
0.21
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