Feature Vector Effectiveness Evaluation for Pattern Selection in Computational Lithography

Pattern selection is crucial for optimizing the calibration process of optical proximity correction (OPC) models in computational lithography. However, it remains a challenge to achieve a balance between representative coverage and computational efficiency. This work presents a comprehensive evaluation of the feature vectors’ (FVs’) effectiveness in pattern selection for OPC model calibration, leveraging key performance indicators (KPIs) based on Kullback–Leibler divergence and distance ranking. Through the construction of autoencoder-based FVs and fast Fourier transform (FFT)-based FVs, we compare their efficacy in capturing critical pattern features. Validation experimental results indicate that autoencoder-based FVs, particularly augmented with the lithography domain knowledge, outperform FFT-based counterparts in identifying anomalies and enhancing lithography model performance. These results also underscore the importance of adaptive pattern representation methods in calibrating the OPC model with evolving complexities.