Transport in a Two-Channel Nanotransistor Device with Lateral Resonant Tunneling
We study field effect nanotransistor devices in the Si/SiO<sub>2</sub> material system which are based on lateral resonant tunneling between two parallel conduction channels. After introducing a simple piecewise linear potential model, we calculate the quantum transport properties in the R-matrix approach. In the transfer characteristics, we find a narrow resonant tunneling peak around zero control voltage. Such a narrow resonant tunneling peak allows one to switch the drain current with small control voltages, thus opening the way to low-energy applications. In contrast to similar double electron layer tunneling transistors that have been studied previously in III-V material systems with much larger channel lengths, the resonant tunneling peak in the drain current is found to persist at room temperature. We employ the R-matrix method in an effective approximation for planar systems and compare the analytical results with full numerical calculations. This provides a basic understanding of the inner processes pertaining to lateral tunneling transport.
Authors
- Amanda Teodora Preda (ORCID: https://orcid.org/0000-0002-2672-6163)
- George Alexandru Nemneş (ORCID: https://orcid.org/0000-0002-8500-4953)
- Ulrich Wulf
Institutions
- University of Bucharest (RO)
- Horia Hulubei National Institute for R and D in Physics and Nuclear Engineering (RO)
- Brandenburg University of Technology Cottbus-Senftenberg (DE)
Publication Details
- Journal
- Micromachines
- Published
- 2024-10-19
- DOI
- https://doi.org/10.3390/mi15101270
- Citations
- 2
- Primary Topic
- Quantum and electron transport phenomena
- Type
- article
- Field-Weighted Citation Impact
- 0.68