Molecular dynamics investigation of nano-polishing on silicon carbide substrate with rough topography using a rotating diamond abrasive

Authors

Yunyun Sun (ORCID: https://orcid.org/0000-0002-4447-1408)
Henry Tan (ORCID: https://orcid.org/0000-0003-4894-8098)
Shijing Wu (ORCID: https://orcid.org/0000-0002-9438-5487)
Bing Wu (ORCID: https://orcid.org/0009-0005-7619-4846)

Publication Details

Journal: Materials Today Communications
Published: 2024-10-18
DOI: https://doi.org/10.1016/j.mtcomm.2024.110744
Citations: 12
Primary Topic: Advanced Surface Polishing Techniques
Type: article
Field-Weighted Citation Impact: 2.21

Funders

National Natural Science Foundation of China
Natural Science Foundation of Hubei Province

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article

Molecular dynamics investigation of nano-polishing on silicon carbide substrate with rough topography using a rotating diamond abrasive

Yunyun Sun, Henry Tan, Shijing Wu, Bing Wu

Oct 18, 2024

12 citations

Materials Today Communications

Advanced Surface Polishing Techniques

2.21

article

Molecular dynamics investigation of nano-polishing on silicon carbide substrate with rough topography using a rotating diamond abrasive

Yunyun Sun, Henry Tan, Shijing Wu, Bing Wu

October 18, 2024article en

12 citations

Abstract

No abstract available for this paper.

Materials Today CommunicationsVol. 41

National Natural Science Foundation of China, Natural Science Foundation of Hubei Province

Openalex Percentile: Top 12%

Advanced Surface Polishing Techniques

2.21

DOI Open Access PDF OpenAlex

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Molecular dynamics investigation of nano-polishing on silicon carbide substrate with rough topography using a rotating diamond abrasive — Yunyun Sun, Henry Tan, et al. · Materials Today Communications (2024) | TGRS Research Map | TGRS