Holographic Multi-Notch Filters Recorded with Simultaneous Double-Exposure Contact Mirror-Based Method

This study presents a novel simultaneous double-exposure contact mirror-based method for fabricating holographic multi-notch filters with dual operational central wavelengths. The proposed method leverages coupled wave theory, the geometric relationships of K-vectors, and a reflection-type recording setup, incorporating additional reflecting mirrors to guide the recording beams. To validate the approach, a holographic notch filter was fabricated using photopolymer recording materials, resulting in operational wavelengths of 531.13 nm and 633.01 nm. The measured diffraction efficiencies at these wavelengths were ηs = 52.35% and ηp = 52.45% for 531.13 nm, and ηs = 67.30% and ηp = 67.40% for 633.01 nm. The component’s performance was analyzed using s- and p-polarized spectral transmission intensities at various reconstruction angles, revealing polarization-independent characteristics under normal incidence and polarization-dependent behavior under oblique incidence. The study also explored the relationships between recording parameters, such as incident angle, wavelength, emulsion expansion, and dispersion. The findings demonstrate that the first operational central wavelength is primarily influenced by the recording wavelength, while the second is primarily determined by the incident angle, covering a range from visible light to near-infrared. This method offers significant potential for cost-effective, mass-produced filters in optoelectronic applications.