Obtaining Nano-Structural Thin Compounds Formed by Microwave Plasma
Microwave plasma technology is a cutting-edge method for synthesizing nanostructural thin compounds. This technique uses microwave radiation to generate plasma, which in turn enables the deposition of thin films with high precision and control. The article provides an overview of the process, key features and advantages, and the practical application of microwave plasma for the synthesis of nanostructural thin compounds.
Authors
- Andrey V. Durakov (ORCID: https://orcid.org/0000-0003-1156-2028)
- Vyacheslav V. Komarov (ORCID: https://orcid.org/0000-0002-2345-086X)
Institutions
- Yuri Gagarin State Technical University of Saratov (RU)
Publication Details
- Published
- 2024-09-26
- DOI
- https://doi.org/10.1109/apede59883.2024.10715908
- Primary Topic
- Nanomaterials for catalytic reactions
- Type
- article
- Field-Weighted Citation Impact
- 0.00