2D Steep‐Slope Tunnel Field‐Effect Transistors Tuned by van der Waals Ferroelectrics
Abstract sPower consumption has emerged as a central concern in the realm of complementary metal‐oxide‐semiconductor (CMOS) technology. Silicon‐based semiconductor devices have now approached the fundamental thermionic limit of the subthreshold swing (SS), which is 60 mV dec −1 , as defined by the Boltzmann tyranny. Tunnel field‐effect transistors (TFETs) are considered promising low‐power devices due to the band‐to‐band tunneling mechanism, which effectively avoids the thermionic limit. However, TFETs require the establishment of a staggered band alignment and currently lack effective techniques for adjusting the band offset. Here, by harnessing the robust ferroelectric field inherent to 2D CuInP 2 S 6 (CIPS), a 2D WSe 2 /MoS 2 heterojunction as well as a WSe 2 homojunction TFET controlled by ferroelectric gate are presented. The newly developed TFET achieves an ultra‐low SS of 14.2 mV dec −1 at room temperature, an on/off current ratio exceeding 10 8 , and a minimal hysteresis window below 10 mV. Additionally, the device demonstrates gate tunable negative differential resistance (NDR) characteristics with a very large peak‐to‐valley current ratio (PVCR) of 10.56 at room temperature. These findings underscore the significant promise of 2D ferroelectric tuning heterojunction and homojunction for future low‐power electronic applications.
Authors
- Xianfu Wang (ORCID: https://orcid.org/0000-0002-2066-7473)
- Xinrui Chen (ORCID: https://orcid.org/0000-0003-0910-4650)
- Yi Cui (ORCID: https://orcid.org/0000-0003-0924-5904)
- Hanbin Wang (ORCID: https://orcid.org/0000-0001-6927-2934)
- Tiantian Jiang
- Chaoyi Yan (ORCID: https://orcid.org/0000-0003-1701-2895)
- Miao Zhang (ORCID: https://orcid.org/0000-0003-3582-6075)
- Nannan Li (ORCID: https://orcid.org/0000-0003-0964-9626)
- Yong Wang (ORCID: https://orcid.org/0000-0003-3366-3137)
- Yuqing Liu (ORCID: https://orcid.org/0000-0002-6324-1296)
- Yang Wang (ORCID: https://orcid.org/0000-0003-4480-1785)
- Xinchuan Du
Institutions
- University of Electronic Science and Technology of China (CN)
- China Academy of Engineering Physics (CN)
- National Engineering Research Center of Electromagnetic Radiation Control Materials (CN)
Publication Details
- Journal
- Advanced Electronic Materials
- Published
- 2024-10-18
- DOI
- https://doi.org/10.1002/aelm.202400463
- Citations
- 5
- Primary Topic
- Ferroelectric and Negative Capacitance Devices
- Type
- article
- Field-Weighted Citation Impact
- 1.04
Funders
- National Natural Science Foundation of China
- Natural Science Foundation of Sichuan Province
- Key Technologies Research and Development Program
- National Key Research and Development Program of China