Manipulating tin ablation for EUV production
Laser-plasma dynamics greatly affect the production of in-band light for lithography in EUV sources. To better tune plasma parameters for efficient EUV production and minimize the production of energetic ions, we explore using modeling in preparation for future experiments to develop and validate higher fidelity predictive capability for EUV sources.
Authors
- Samuel Totorica (ORCID: https://orcid.org/0000-0002-7126-464X)
- W. Fox (ORCID: https://orcid.org/0000-0001-6289-858X)
- A. Diallo (ORCID: https://orcid.org/0000-0002-0706-060X)
- A. Morozov (ORCID: https://orcid.org/0000-0001-5486-235X)
- K. V. Lezhnin (ORCID: https://orcid.org/0000-0002-7636-069X)
- A. F. GRIFFITH
Institutions
- Princeton University (US)
- Princeton Plasma Physics Laboratory (US)
Publication Details
- Published
- 2024-10-17
- DOI
- https://doi.org/10.1117/12.3037004
- Primary Topic
- Electron and X-Ray Spectroscopy Techniques
- Type
- article
- Field-Weighted Citation Impact
- 0.00