Novel super stack passivation in AlGaN/GaN HEMT for power electronic applications

Abstract A super-stack passivation technique is proposed for an AlGaN/GaN HEMT in order to improve the breakdown voltage and cutoff frequency. The performance of the proposed technique is benchmarked against a conventional GaN HEMT. The analysis and investigation are carried out using Technology Computer-Aided Design (TCAD). The simulation results are validated with experimental data. It is observed that the breakdown voltage of the conventional and proposed devices is 356V and 449V, respectively. In contrast to the conventional device, the breakdown voltage of the proposed device is improved by 21%. This is the manifestation of the suppression of the electric field by the super-stack passivation technique in the proposed device. Furthermore, it is also observed that the Johnson’s figure of merit in the proposed GaN-HEMT is also improved.

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Publication Details

Journal
Materials Research Express
Published
2024-10-17
DOI
https://doi.org/10.1088/2053-1591/ad8861
Citations
4
Primary Topic
GaN-based semiconductor devices and materials
Type
article
Field-Weighted Citation Impact
1.24
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article

Novel super stack passivation in AlGaN/GaN HEMT for power electronic applications

K. Suresh, A. Arunraja
4 citations
Materials Research Express
GaN-based semiconductor devices and materials
1.24
article

Novel super stack passivation in AlGaN/GaN HEMT for power electronic applications

K. Suresh, A. Arunraja
article en
4 citations

Abstract

Abstract A super-stack passivation technique is proposed for an AlGaN/GaN HEMT in order to improve the breakdown voltage and cutoff frequency. The performance of the proposed technique is benchmarked against a conventional GaN HEMT. The analysis and investigation are carried out using Technology Computer-Aided Design (TCAD). The simulation results are validated with experimental data. It is observed that the breakdown voltage of the conventional and proposed devices is 356V and 449V, respectively. In contrast to the conventional device, the breakdown voltage of the proposed device is improved by 21%. This is the manifestation of the suppression of the electric field by the super-stack passivation technique in the proposed device. Furthermore, it is also observed that the Johnson’s figure of merit in the proposed GaN-HEMT is also improved.

Materials Research ExpressVol. 11(11)
Christ University (IN)
Openalex Percentile: Top 21%
GaN-based semiconductor devices and materials
1.24
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