Ultrafast Electron Dynamics at the P‐rich Indium Phosphide/TiO<sub>2</sub> Interface

Abstract The current efficiency records for generating green hydrogen via solar water splitting are held by indium phosphide (InP)‐based photo‐absorbers, protected by TiO 2 layers grown through atomic layer deposition (ALD). InP is also a leading material for photonic integrated circuits and computing, where ultrafast near‐surface behavior is key. A previous study described electronic pathways at the phosphorus‐rich (P‐rich) surface of p‐doped InP(100) using time‐resolved two‐photon photoemission (tr‐2PPE) spectroscopy. Here, the intricate electron pathways of the P‐rich InP surface modified with ALD‐deposited TiO 2 are explored. Photoexcited bulk InP electrons migrate through a bulk‐to‐surface transition cluster of states and surface states and inject into the TiO 2 conduction band (CB). Energy levels and occupation dynamics of CB states in P‐rich InP and TiO 2 adlayers are observed, with discrete states preserved up to 10 nm TiO 2 deposition. Thermalization lifetimes of excited electrons &gt; 0.8 eV above the InP conduction band minimum (CBM) are preserved for layer thicknesses up to 2.5 nm. Annealing at 300 °C to achieve crystalline TiO 2 reconstructions destroys interfacial states, affecting charge transfer. These observations enable innovative engineering of the P‐rich InP/TiO 2 heterointerface, opening new possibilities for studying hot‐carrier extraction, adsorbate effects, surface plasmons, and improving photovoltaic and PEC water‐splitting devices.

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Publication Details

Journal
Advanced Functional Materials
Published
2024-10-16
DOI
https://doi.org/10.1002/adfm.202409455
Citations
5
Primary Topic
Electronic and Structural Properties of Oxides
Type
article
Field-Weighted Citation Impact
0.59

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article

Ultrafast Electron Dynamics at the P‐rich Indium Phosphide/TiO2 Interface

Christian Höhn, Jonathan Diederich, Rainer Eichberger, Mohammad Amin Zare Pour et al.
5 citations
Advanced Functional Materials
Electronic and Structural Properties of Oxides
0.59
article

Ultrafast Electron Dynamics at the P‐rich Indium Phosphide/TiO2 Interface

Christian Höhn, Jonathan Diederich, Rainer Eichberger, Mohammad Amin Zare Pour, Thomas Hannappel, Jennifer Velázquez Rojas, David Ostheimer, Dennis Friedrich, Klaus Schwarzburg, W. G. Schmidt, Roel van de Krol, Isaac Azahel Ruiz Alvarado, Agnieszka Paszuk
article en
5 citations

Abstract

Abstract The current efficiency records for generating green hydrogen via solar water splitting are held by indium phosphide (InP)‐based photo‐absorbers, protected by TiO 2 layers grown through atomic layer deposition (ALD). InP is also a leading material for photonic integrated circuits and computing, where ultrafast near‐surface behavior is key. A previous study described electronic pathways at the phosphorus‐rich (P‐rich) surface of p‐doped InP(100) using time‐resolved two‐photon photoemission (tr‐2PPE) spectroscopy. Here, the intricate electron pathways of the P‐rich InP surface modified with ALD‐deposited TiO 2 are explored. Photoexcited bulk InP electrons migrate through a bulk‐to‐surface transition cluster of states and surface states and inject into the TiO 2 conduction band (CB). Energy levels and occupation dynamics of CB states in P‐rich InP and TiO 2 adlayers are observed, with discrete states preserved up to 10 nm TiO 2 deposition. Thermalization lifetimes of excited electrons &gt; 0.8 eV above the InP conduction band minimum (CBM) are preserved for layer thicknesses up to 2.5 nm. Annealing at 300 °C to achieve crystalline TiO 2 reconstructions destroys interfacial states, affecting charge transfer. These observations enable innovative engineering of the P‐rich InP/TiO 2 heterointerface, opening new possibilities for studying hot‐carrier extraction, adsorbate effects, surface plasmons, and improving photovoltaic and PEC water‐splitting devices.

Advanced Functional MaterialsVol. 34(49)
Technische Universität Ilmenau (DE), Paderborn University (DE), Helmholtz-Zentrum Berlin für Materialien und Energie (DE), Technische Universität Berlin (DE)
Deutsche Forschungsgemeinschaft, Bundesministerium für Bildung und Forschung
Openalex Percentile: Top 33%
Electronic and Structural Properties of Oxides
0.59
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