Reverse Gate Leakage Induced Buffer Charging and Threshold Voltage Shift of GaN HEMTs

We discuss a physical mechanism in the AlGaN/GaN high electron mobility transistors (HEMTs) that partial electrons from reverse gate leakage (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${I}_{\text {g,off}}$ </tex-math></inline-formula>) inject into the HEMT buffer and thereby shift the HEMT threshold voltage (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\Delta {V}_{\text {th}}$ </tex-math></inline-formula>). We analyze the <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\Delta {V}_{\text {th}}$ </tex-math></inline-formula> dependences on parameters including gate lengths, front barrier (FB) thickness, gate bias voltage, drain bias voltage, and the distance between the gate and the buffer. We specifically investigate the off-state stress with nonzero and zero <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\text {ds}}$ </tex-math></inline-formula>. The experiment with zero <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\text {ds}}$ </tex-math></inline-formula> helps identify the <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${I}_{\text {g,off}}$ </tex-math></inline-formula> induced C doped GaN (C-GaN) charging; while the one nonzero <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\text {ds}}$ </tex-math></inline-formula> indicates a fast increase of C-GaN charging induced <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\Delta {V}_{\text {th}}$ </tex-math></inline-formula> with <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\mathbf {ds}}$ </tex-math></inline-formula>. The <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\Delta {V}_{\text {th}}$ </tex-math></inline-formula> issue is significant for downscaled HEMTs with a short gate length and a close distance between the gate and the buffer. The issue is thus critical for downscaled HEMTs in high-speed RF applications. We propose a simple analytical expression for the <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\Delta {V}_{\text {th}}$ </tex-math></inline-formula> and demonstrate methods to reduce the <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\Delta {V}_{\text {th}}$ </tex-math></inline-formula>.

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Publication Details

Journal
IEEE Transactions on Electron Devices
Published
2024-10-16
DOI
https://doi.org/10.1109/ted.2024.3473892
Citations
2
Primary Topic
Advancements in Semiconductor Devices and Circuit Design
Type
article
Field-Weighted Citation Impact
0.42
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article

Reverse Gate Leakage Induced Buffer Charging and Threshold Voltage Shift of GaN HEMTs

Tian‐Li Wu, Rana ElKashlan, Sourish Banerjee, Nadine Collaert et al.
2 citations
IEEE Transactions on Electron Devices
Advancements in Semiconductor Devices and Circuit Design
0.42
article

Reverse Gate Leakage Induced Buffer Charging and Threshold Voltage Shift of GaN HEMTs

Tian‐Li Wu, Rana ElKashlan, Sourish Banerjee, Nadine Collaert, Uthayasankaran Peralagu, Hao Yu, Sachin Yadav, Barry O’Sullivan, Bertrand Parvais, Aarti Rathi, Tzu-Heng Lin, A. Alian
article en
2 citations

Abstract

We discuss a physical mechanism in the AlGaN/GaN high electron mobility transistors (HEMTs) that partial electrons from reverse gate leakage (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${I}_{\text {g,off}}$ </tex-math></inline-formula>) inject into the HEMT buffer and thereby shift the HEMT threshold voltage (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\Delta {V}_{\text {th}}$ </tex-math></inline-formula>). We analyze the <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\Delta {V}_{\text {th}}$ </tex-math></inline-formula> dependences on parameters including gate lengths, front barrier (FB) thickness, gate bias voltage, drain bias voltage, and the distance between the gate and the buffer. We specifically investigate the off-state stress with nonzero and zero <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\text {ds}}$ </tex-math></inline-formula>. The experiment with zero <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\text {ds}}$ </tex-math></inline-formula> helps identify the <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${I}_{\text {g,off}}$ </tex-math></inline-formula> induced C doped GaN (C-GaN) charging; while the one nonzero <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\text {ds}}$ </tex-math></inline-formula> indicates a fast increase of C-GaN charging induced <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\Delta {V}_{\text {th}}$ </tex-math></inline-formula> with <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\mathbf {ds}}$ </tex-math></inline-formula>. The <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\Delta {V}_{\text {th}}$ </tex-math></inline-formula> issue is significant for downscaled HEMTs with a short gate length and a close distance between the gate and the buffer. The issue is thus critical for downscaled HEMTs in high-speed RF applications. We propose a simple analytical expression for the <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\Delta {V}_{\text {th}}$ </tex-math></inline-formula> and demonstrate methods to reduce the <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\Delta {V}_{\text {th}}$ </tex-math></inline-formula>.

IEEE Transactions on Electron DevicesVol. 71(12)
National Yang Ming Chiao Tung University (TW), IMEC (BE)
Affordable and clean energy
Openalex Percentile: Top 37%
Advancements in Semiconductor Devices and Circuit Design
0.42
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