“M”-Shaped Threshold Voltage Shift Induced by Competitive Positive/Negative Gate Switching Stress in Schottky-Type p-GaN Gate HEMTs
This work investigates the threshold voltage (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\text {th}}\text {)}$ </tex-math></inline-formula> instability in Schottky-type p-GaN gate HEMTs subjected to positive/negative gate switching stress. Under the gate switching stress, a characteristic “M”-shaped <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\text {th}}$ </tex-math></inline-formula> curve with elevated <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\text {GS,ON}}$ </tex-math></inline-formula> is revealed. This pattern is ascribed to the competitive transport of electrons and holes. Considering the condition of reduced <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\text {GS, OFF}}$ </tex-math></inline-formula>, an increasing <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V} _{\text {th}}$ </tex-math></inline-formula> has also been observed, which is attributed to the curtailed electron emission while the promoted hole release. Further, with the increasing of the duty cycle, a positive <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\text {th}}$ </tex-math></inline-formula> shift at the lower <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\text {GS, ON}}$ </tex-math></inline-formula> and a negative shift at higher <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\text {GS, ON}}$ </tex-math></inline-formula> are needs to be taken seriously, and it also confirm the competitive mechanism in the abnormal “M”-shaped <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\text {th}}$ </tex-math></inline-formula> instability. The research highlights that the impact of positive/negative gate switching stress on <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\text {th}}$ </tex-math></inline-formula> instability are significant and cannot be neglected.
Authors
- Xinghuan Chen (ORCID: https://orcid.org/0000-0002-8294-1730)
- Yunfeng Hu
- Yuan Li (ORCID: https://orcid.org/0000-0003-1360-2775)
- Yuan Chen
- Zongqi Cai (ORCID: https://orcid.org/0000-0001-8471-2539)
- Yijun Shi (ORCID: https://orcid.org/0000-0001-8485-1109)
- Xiaoli Lu (ORCID: https://orcid.org/0000-0003-3689-5996)
- Zhizhe Wang (ORCID: https://orcid.org/0000-0002-5907-1669)
- Liang He (ORCID: https://orcid.org/0000-0003-3650-5679)
- Zhiyuan He (ORCID: https://orcid.org/0000-0002-0064-3626)
- Meng Dong (ORCID: https://orcid.org/0000-0002-6434-1678)
- Hongyue Wang (ORCID: https://orcid.org/0000-0002-3070-0732)
- Yiqiang Chen (ORCID: https://orcid.org/0000-0001-6901-3000)
- Yiqiang Ni
Institutions
- Xidian University (CN)
- China Electronic Product Reliability and Environmental Test Institute (CN)
Publication Details
- Journal
- IEEE Electron Device Letters
- Published
- 2024-10-14
- DOI
- https://doi.org/10.1109/led.2024.3480253
- Citations
- 2
- Primary Topic
- GaN-based semiconductor devices and materials
- Type
- article
- Field-Weighted Citation Impact
- 0.62
Funders
- National Natural Science Foundation of China