Investigating the Tapered Profiles on the Parasitic Inductance of Through-Silicon Vias

In this study, we extract S-parameters from a ground-signal–ground (GSG)-type tapered through-silicon via (TSV) model within the frequency range of 20–40 GHz and subsequently convert them into the resistance, inductance, conductance, and capacitance (RLGC) electrical model. We analyze the impact of tapers on TSV inductance and develop a comprehensive formulation to rigorously account for the parasitic inductance of tapered TSVs in high-density 3-D integration, based on geometrical parameters. Furthermore, we explore the correlation between the pitch of vias and the composition of the TSV’s parasitic inductance.

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Publication Details

Journal
IEEE Transactions on Components Packaging and Manufacturing Technology
Published
2024-10-14
DOI
https://doi.org/10.1109/tcpmt.2024.3480697
Citations
1
Primary Topic
Semiconductor materials and interfaces
Type
article
Field-Weighted Citation Impact
0.34
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article

Investigating the Tapered Profiles on the Parasitic Inductance of Through-Silicon Vias

Tianpeng Liang, Wenlei Li, Jinxu Liu, Libin Gao et al.
1 citations
IEEE Transactions on Components Packaging and Manufacturing Technology
Semiconductor materials and interfaces
0.34
article

Investigating the Tapered Profiles on the Parasitic Inductance of Through-Silicon Vias

Tianpeng Liang, Wenlei Li, Jinxu Liu, Libin Gao, Hongwei Chen, Zhen Fang, Wanli Zhang, Jihua Zhang
article en
1 citations

Abstract

In this study, we extract S-parameters from a ground-signal–ground (GSG)-type tapered through-silicon via (TSV) model within the frequency range of 20–40 GHz and subsequently convert them into the resistance, inductance, conductance, and capacitance (RLGC) electrical model. We analyze the impact of tapers on TSV inductance and develop a comprehensive formulation to rigorously account for the parasitic inductance of tapered TSVs in high-density 3-D integration, based on geometrical parameters. Furthermore, we explore the correlation between the pitch of vias and the composition of the TSV’s parasitic inductance.

IEEE Transactions on Components Packaging and Manufacturing TechnologyVol. 14(11)
University of Electronic Science and Technology of China (CN), Chengdu University of Technology (CN), National Engineering Research Center of Electromagnetic Radiation Control Materials (CN)
Openalex Percentile: Top 40%
Semiconductor materials and interfaces
0.34
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Investigating the Tapered Profiles on the Parasitic Inductance of Through-Silicon Vias — Tianpeng Liang, Wenlei Li, et al. · IEEE Transactions on Components Packaging and Manufacturing Technology (2024) | TGRS Research Map | TGRS