Interface Dependent Coexistence of Two‐Dimensional Electron and Hole Gases in Mn‐doped InAs/GaSb

Abstract The interface of common III‐V semiconductors InAs and GaSb can be utilized to realize a two‐dimensional (2D) topological insulator state. The 2D electronic gas at this interface can yield Hall quantization from coexisting electrons and holes. This anomaly is a determining factor in the fundamental origin of the topological state in InAs/GaSb. Here, the coexistence of electrons and holes in InAs/GaSb is tied to the chemical sharpness of the interface. Magnetotransport, in samples of Mn‐doped InAs/GaSb cleaved from wafers grown at a spatially inhomogeneous substrate temperature, is studied. It is reported that the observation of quantum oscillations and a quantized Hall effect whose behavior, exhibiting coexisting electrons and holes, is tuned by this spatial nonuniformity. Through transmission electron microscopy measurements, it is additionally found that samples that host this co‐existence exhibit a chemical intermixing between group III and group V atoms that extends over a larger thickness about the interface. The issue of intermixing at the interface is systematically overlooked in electronic transport studies of topological InAs/GaSb. These findings address this gap in knowledge and shed important light on the origin of the anomalous behavior of quantum oscillations seen in this 2D topological insulator.

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Publication Details

Journal
Advanced Materials Interfaces
Published
2024-10-13
DOI
https://doi.org/10.1002/admi.202400630
Citations
3
Primary Topic
Electronic and Structural Properties of Oxides
Type
article
Field-Weighted Citation Impact
0.35

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article

Interface Dependent Coexistence of Two‐Dimensional Electron and Hole Gases in Mn‐doped InAs/GaSb

Jiashu Wang, Badih A. Assaf, Steven P. Bennett, Tommy Kotte et al.
3 citations
Advanced Materials Interfaces
Electronic and Structural Properties of Oxides
0.35
article

Interface Dependent Coexistence of Two‐Dimensional Electron and Hole Gases in Mn‐doped InAs/GaSb

Jiashu Wang, Badih A. Assaf, Steven P. Bennett, Tommy Kotte, Seul‐Ki Bac, Shelby S. Fields, Maksym Zhukovskyi, David E Graf, Logan Riney, Xinyu Liu, Tatyana Orlova
article en
3 citations

Abstract

Abstract The interface of common III‐V semiconductors InAs and GaSb can be utilized to realize a two‐dimensional (2D) topological insulator state. The 2D electronic gas at this interface can yield Hall quantization from coexisting electrons and holes. This anomaly is a determining factor in the fundamental origin of the topological state in InAs/GaSb. Here, the coexistence of electrons and holes in InAs/GaSb is tied to the chemical sharpness of the interface. Magnetotransport, in samples of Mn‐doped InAs/GaSb cleaved from wafers grown at a spatially inhomogeneous substrate temperature, is studied. It is reported that the observation of quantum oscillations and a quantized Hall effect whose behavior, exhibiting coexisting electrons and holes, is tuned by this spatial nonuniformity. Through transmission electron microscopy measurements, it is additionally found that samples that host this co‐existence exhibit a chemical intermixing between group III and group V atoms that extends over a larger thickness about the interface. The issue of intermixing at the interface is systematically overlooked in electronic transport studies of topological InAs/GaSb. These findings address this gap in knowledge and shed important light on the origin of the anomalous behavior of quantum oscillations seen in this 2D topological insulator.

Advanced Materials InterfacesVol. 12(5)
Florida State University (US), University of Notre Dame (US), United States Naval Research Laboratory (US), Helmholtz-Zentrum Dresden-Rossendorf (DE), National High Magnetic Field Laboratory (US)
National Science Foundation, National High Magnetic Field Laboratory, Helmholtz-Zentrum Dresden-Rossendorf, Notre Dame Integrated Imaging Facility, University of Notre Dame, Office of Naval Research, Division of Materials Research, U.S. Naval Research Laboratory
Openalex Percentile: Top 44%
Electronic and Structural Properties of Oxides
0.35
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