Morphological and structural properties of antimony selenide thin films deposited with external electric field assistance

A method for producing a thin semiconductor film of antimony selenide (Sb2Se3) via vacuum thermal evaporation with the assistance of an electric field was presented. The morphological, elemental and structural properties of the thin films were characterized using X-ray diffraction and scanning electron microscopy (with energy dispersive X-ray spectroscopy). It was found that an applied constant electric field plays an important role in obtaining Sb2Se3 thin films with the desired morphological and structural properties. The latter is a useful tool for controlling charge transport properties in thin films.

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Publication Details

Journal
«Узбекский физический журнал»
Published
2024-10-13
DOI
https://doi.org/10.52304/.v26i3.537
Primary Topic
Chalcogenide Semiconductor Thin Films
Type
article
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article

Morphological and structural properties of antimony selenide thin films deposited with external electric field assistance

A. Olimov, Urol Kudratovich Makhmanov, К. M. Kuchkarov, M. A. Makhmudov et al.
«Узбекский физический журнал»
Chalcogenide Semiconductor Thin Films
article

Morphological and structural properties of antimony selenide thin films deposited with external electric field assistance

A. Olimov, Urol Kudratovich Makhmanov, К. M. Kuchkarov, M. A. Makhmudov, T.M. Razykov, А. Х. Шукуров
article en

Abstract

A method for producing a thin semiconductor film of antimony selenide (Sb2Se3) via vacuum thermal evaporation with the assistance of an electric field was presented. The morphological, elemental and structural properties of the thin films were characterized using X-ray diffraction and scanning electron microscopy (with energy dispersive X-ray spectroscopy). It was found that an applied constant electric field plays an important role in obtaining Sb2Se3 thin films with the desired morphological and structural properties. The latter is a useful tool for controlling charge transport properties in thin films.

«Узбекский физический журнал»Vol. 26(3)
Academy of Sciences Republic of Uzbekistan (UZ), Institute of Ion Plasma Laser Technologies (UZ), National University of Uzbekistan (UZ)
Openalex Percentile: Top 85%
Chalcogenide Semiconductor Thin Films
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