Enhancement of copper nanoparticle yield in magnetron sputter inert gas condensation by applying substrate bias voltage and its influence on thin film morphology

Large-scale synthesis of high-purity nanoparticles is an intense topic of scientific research, with magnetron sputter inert gas condensation recognized as a promising, environmentally friendly technique avoiding wet chemical processes. This study explores the deposition of size-selected nanoparticles under varied substrate bias voltages and reports on a consequent increase in deposition rates up to 32 %. These alterations in substrate bias voltage induce a progressive change in the morphology of the resulting nanoparticle thin films, attributable to the increased kinetic energy of the nanoparticles. Comprehensive characterization via quadrupole mass spectroscopy of the nanoparticle flux, scanning electron microscopy, X-ray photoelectron spectroscopy, and low-energy ion scattering spectroscopy of the deposited nanoparticles corroborates the enhanced nanoparticle yield associated with increased substrate bias voltage. These findings signify a methodological advancement, enhancing the efficiency of magnetron sputter inert gas condensation and moving the technology a step further towards feasible industrial production. • Enhanced nanoparticle yield by 32% using substrate bias voltage in MS-IGC. • Morphological evolution of nanoparticle thin films under varied bias voltages. • Nanoparticle characterization via SEM, XPS, and LEIS techniques. • Technological innovation in nanoparticle deposition efficiency. • Industrial implications for scalable nanoparticle production methods.