Intense violet electroluminescence of thin SiO2 layers with SnO2 nanocrystals

• SnO 2 nanocrystals in SiO 2 exhibit intense violet electroluminescence at 3.21 eV. • External quantum efficiency increases with decrease of Sn concentration in SiO 2 . • The maximum external quantum efficiency was found to be 0.7 %. • EL intensity depends on the applied field in accordance with Pool–Frenkel effect. It has been shown that Sn implantation with subsequent annealing in air leads to an increase in the electroluminescence (EL) intensity of SiO 2 /Si structure by two orders of magnitude. Intense violet EL with a maximum at 3.21 eV was observed at room temperature by the naked eye at forward bias. The observed emission was attributed to radiative recombination in SnO 2 nanocrystals synthesized in SiO 2 layers. The external quantum efficiency (EQE) increased with decreasing Sn concentration The maximum external quantum efficiency was found to be 0.7 % for the silica film Sn-implanted at the lowest fluence of 2.5 × 10 16 cm −2 . The non-radiative charge transport (shunt current) through the sample and mechanism of EL excitation are discussed. It has been concluded that the Poole–Frenkel mechanism, or tunneling between traps are the most likely mechanisms of charge transport to light-emitting centers.

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Publication Details

Journal
Results in Optics
Published
2024-10-11
DOI
https://doi.org/10.1016/j.rio.2024.100750
Primary Topic
Silicon Nanostructures and Photoluminescence
Type
article
Field-Weighted Citation Impact
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article

Intense violet electroluminescence of thin SiO2 layers with SnO2 nanocrystals

Л. А. Власукова, I. A. Romanov, E. Wendler, И. Н. Пархоменко et al.
Results in Optics
Silicon Nanostructures and Photoluminescence
article

Intense violet electroluminescence of thin SiO2 layers with SnO2 nanocrystals

Л. А. Власукова, I. A. Romanov, E. Wendler, И. Н. Пархоменко, Ф. Ф. Комаров
article en

Abstract

• SnO 2 nanocrystals in SiO 2 exhibit intense violet electroluminescence at 3.21 eV. • External quantum efficiency increases with decrease of Sn concentration in SiO 2 . • The maximum external quantum efficiency was found to be 0.7 %. • EL intensity depends on the applied field in accordance with Pool–Frenkel effect. It has been shown that Sn implantation with subsequent annealing in air leads to an increase in the electroluminescence (EL) intensity of SiO 2 /Si structure by two orders of magnitude. Intense violet EL with a maximum at 3.21 eV was observed at room temperature by the naked eye at forward bias. The observed emission was attributed to radiative recombination in SnO 2 nanocrystals synthesized in SiO 2 layers. The external quantum efficiency (EQE) increased with decreasing Sn concentration The maximum external quantum efficiency was found to be 0.7 % for the silica film Sn-implanted at the lowest fluence of 2.5 × 10 16 cm −2 . The non-radiative charge transport (shunt current) through the sample and mechanism of EL excitation are discussed. It has been concluded that the Poole–Frenkel mechanism, or tunneling between traps are the most likely mechanisms of charge transport to light-emitting centers.

Results in OpticsVol. 17
Belarusian State University (BY), Institute of Applied Physics (BY), Friedrich Schiller University Jena (DE)
Openalex Percentile: Top 89%
Silicon Nanostructures and Photoluminescence
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