Integration of ferroelectric materials on advanced gate-all-around device – an introduction

Authors

Jens Trommer (ORCID: https://orcid.org/0000-0003-2972-438X)
Thomas Mikolajick (ORCID: https://orcid.org/0000-0003-3814-0378)
Leonardo Cancellara (ORCID: https://orcid.org/0000-0002-4663-5162)
Guilhem Larrieu (ORCID: https://orcid.org/0000-0001-5157-2277)
Bruno Neckel Wesling
Κωνσταντίνος Μουστάκας (ORCID: https://orcid.org/0000-0002-1721-7121)
Niccolo Pezzato
Aurélie Lecestre

Institutions

Laboratoire d'Analyse et d'Architecture des Systèmes (FR)
NaMLab (Germany) (DE)
Laboratoire des Technologies de la Microélectronique (FR)
Technische Universität Dresden (DE)

Publication Details

Journal: SPIRE - Sciences Po Institutional REpository
Published: 2024-09-09
Primary Topic: Semiconductor materials and devices
Type: article
Field-Weighted Citation Impact: 0.00

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article

Integration of ferroelectric materials on advanced gate-all-around device – an introduction

Jens Trommer, Thomas Mikolajick, Leonardo Cancellara, Guilhem Larrieu et al.

Sep 9, 2024

SPIRE - Sciences Po Institutional REpository

Semiconductor materials and devices

article

Integration of ferroelectric materials on advanced gate-all-around device – an introduction

Jens Trommer, Thomas Mikolajick, Leonardo Cancellara, Guilhem Larrieu, Bruno Neckel Wesling, Κωνσταντίνος Μουστάκας, Niccolo Pezzato, Aurélie Lecestre

September 9, 2024article en

Abstract

No abstract available for this paper.

SPIRE - Sciences Po Institutional REpository

Laboratoire d'Analyse et d'Architecture des Systèmes (FR), NaMLab (Germany) (DE), Laboratoire des Technologies de la Microélectronique (FR), Technische Universität Dresden (DE)

Openalex Percentile: Top 85%

Semiconductor materials and devices

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