A Study of the Space Charge-Limited Injection Currents in TiO2-Based Thin-Film Metal-Dielectric Structures

Space charge-limited currents in Ti–TiO2 thin-film structures have been studied. Using the experimental physical parameters of the TiO2 dielectric, models of the formation of the space charge-limited injection currents have been constructed. The dependences of the injection current on the applied voltage, dielectric layer thickness, and parameters of electron traps have been explored. It is shown that the space charge-limited injection currents in the investigated structures depend significantly on both the depth and concentration of traps. The results obtained are compared with the dependences obtained previously for the BeO, Al2O3, and AlN structures.