The degradation mechanism of high power S-band AlGaN/GaN HEMTs under high temperature

Abstract The radio frequency (RF) degradation mechanism under high temperature is proposed in this paper. The saturated output power ( P sat ), power added efficiency (PAE) and gain of the HEMTs deteriorate significantly under high power dissipation operation conditions, which contribute to an elevation of the junction temperature ( T j ). The high T j causes a negative shift of the threshold voltage and a reduction of electron mobility, as well as enhancing the trapping effects of the devices. As a result, the P sat and PAE of the high-power HEMTs ( P sat = 152 W) decreased by 0.76 dB and 8.3%, respectively, which is more severe compared to low-power HEMTs ( P sat = 20 W), where P sat and PAE reduced by 0.16 dB and 3.1% when the operation temperature was increased from 25 °C to 150 °C. By increasing the gate-to-drain distance from 1.625 to 2.175 μ m, drain current stability and high temperature reverse bias reliability are improved. The results demonstrate that the trapping effect can be suppressed by decreasing the electric field under the gate; therefore, the RF output characteristics are boosted by 1.2 W, 1 dB and 2.6% for a device with gate width of 11.52 mm.

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Publication Details

Journal
Journal of Physics D Applied Physics
Published
2024-10-08
DOI
https://doi.org/10.1088/1361-6463/ad8455
Primary Topic
GaN-based semiconductor devices and materials
Type
article
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article

The degradation mechanism of high power S-band AlGaN/GaN HEMTs under high temperature

Tao Xu, Chuan Cheng, Gaopeng Chen, Guoguo Liu et al.
Journal of Physics D Applied Physics
GaN-based semiconductor devices and materials
article

The degradation mechanism of high power S-band AlGaN/GaN HEMTs under high temperature

Tao Xu, Chuan Cheng, Gaopeng Chen, Guoguo Liu, Tingting Yuan, Shumeng Yan, Lijie Chen, Tianying Yang
article en

Abstract

Abstract The radio frequency (RF) degradation mechanism under high temperature is proposed in this paper. The saturated output power ( P sat ), power added efficiency (PAE) and gain of the HEMTs deteriorate significantly under high power dissipation operation conditions, which contribute to an elevation of the junction temperature ( T j ). The high T j causes a negative shift of the threshold voltage and a reduction of electron mobility, as well as enhancing the trapping effects of the devices. As a result, the P sat and PAE of the high-power HEMTs ( P sat = 152 W) decreased by 0.76 dB and 8.3%, respectively, which is more severe compared to low-power HEMTs ( P sat = 20 W), where P sat and PAE reduced by 0.16 dB and 3.1% when the operation temperature was increased from 25 °C to 150 °C. By increasing the gate-to-drain distance from 1.625 to 2.175 μ m, drain current stability and high temperature reverse bias reliability are improved. The results demonstrate that the trapping effect can be suppressed by decreasing the electric field under the gate; therefore, the RF output characteristics are boosted by 1.2 W, 1 dB and 2.6% for a device with gate width of 11.52 mm.

Journal of Physics D Applied PhysicsVol. 58(3)
RTX (United States) (US)
Openalex Percentile: Top 90%
GaN-based semiconductor devices and materials
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The degradation mechanism of high power S-band AlGaN/GaN HEMTs under high temperature — Tao Xu, Chuan Cheng, et al. · Journal of Physics D Applied Physics (2024) | TGRS Research Map | TGRS