Optimizing Forward Drop and Reverse Leakage Trade‐Off in AlGaN/GaN Lateral Diode with Schottky‐Metal‐Insulator‐Semiconductor Cascode Anode
Herein, AlGaN/GaN lateral diode with the Schottky‐Metal‐Insulator‐Semiconductor (MIS) cascode anode (CALD) to optimize forward voltage drop ( V F ) and reverse leakage current ( I LEAK ) trade‐off is proposed. In the CALD device, a normally‐on Ni/HfO 2 /AlGaN MIS‐controlled channel as well as a lateral Ni/GaN Schottky contact are cascoded at the anode. The designed normally‐on MIS‐controlled channel has high electron concentration at forward bias and prevents high electric‐field at reverse bias, which ensure both low V F and low I LEAK . Meanwhile, the Ni/GaN Schottky contact with a high Schottky barrier height further suppresses the I LEAK . As a result, the fabricated CALD demonstrates an optimized V F – I LEAK trade‐off relationship, including a low V F of 1.6 V and a low I LEAK of 5.2 × 10 −8 A mm −1 (at reverse voltage of 400 V), together with a high breakdown voltage (BV) >700 V. These high performances suggest that the CALD can be a promising candidate for GaN power diode applications requiring a better V F – I LEAK trade‐off.
Authors
- Ping Yu
- Zeheng Wang (ORCID: https://orcid.org/0000-0002-6994-1234)
- Peng Zuo
- Cheng Yu (ORCID: https://orcid.org/0000-0002-3883-4858)
- Wanjun Chen (ORCID: https://orcid.org/0000-0002-8398-4548)
- Zhuocheng Wang (ORCID: https://orcid.org/0000-0001-9535-2727)
- Xiaohui Wang (ORCID: https://orcid.org/0000-0002-1442-8732)
- Yang Wang (ORCID: https://orcid.org/0000-0001-8873-5957)
- Hong Chen (ORCID: https://orcid.org/0000-0003-4283-6095)
- Haiqiang Jia (ORCID: https://orcid.org/0000-0003-1919-9403)
- Guojian Ding (ORCID: https://orcid.org/0009-0008-9685-935X)
- Chang Gao (ORCID: https://orcid.org/0000-0002-8130-1854)
- Fangzhou Wang (ORCID: https://orcid.org/0000-0001-5000-2133)
- Qi Feng (ORCID: https://orcid.org/0009-0003-3496-1619)
- Bo Zhang (ORCID: https://orcid.org/0009-0002-9957-5914)
Institutions
- University of Electronic Science and Technology of China (CN)
- Southern University of Science and Technology (CN)
- Songshan Lake Materials Laboratory (CN)
- National Engineering Research Center of Electromagnetic Radiation Control Materials (CN)
- CSIRO Manufacturing (AU)
Publication Details
- Journal
- physica status solidi (a)
- Published
- 2024-10-08
- DOI
- https://doi.org/10.1002/pssa.202400338
- Primary Topic
- GaN-based semiconductor devices and materials
- Type
- article
- Field-Weighted Citation Impact
- 0.00
Funders
- Commonwealth Scientific and Industrial Research Organisation
- National Natural Science Foundation of China
- Basic and Applied Basic Research Foundation of Guangdong Province