Insights into oxygen vacancy dynamics in HfO2–ZrO2 superlattice ferroelectric films: Implications for device reliability

Compared with solid solution (SS) Hf0.5Zr0.5O2, HfO2–ZrO2 superlattice (SL) ferroelectric films exhibit enhanced endurance and reduced leakage. However, so far, the underlying physical mechanism is still missing. In this work, first-principle calculations reveal that the superior reliability arises from the precise control in the spatial profile of oxygen vacancy with the stacked structure in SL in which oxygen vacancies (Vo) exhibit different formation energies and different energy profiles in Zr- and Hf-layers. However, Vo have the tendency to migrate and its suppression become critical to maintain the superiority of SL. A low annealing temperature is, therefore, suggested and validated with our fabricated SL- and SS-ferroelectric films with different annealing temperatures. This understanding can pave ways for the optimization in SL ferroelectric films.

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Publication Details

Journal
Journal of Applied Physics
Published
2024-10-08
DOI
https://doi.org/10.1063/5.0227170
Citations
13
Primary Topic
Ferroelectric and Negative Capacitance Devices
Type
article
Field-Weighted Citation Impact
2.71

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article

Insights into oxygen vacancy dynamics in HfO2–ZrO2 superlattice ferroelectric films: Implications for device reliability

Runsheng Wang, Yichen Wen, Jinhao Liu, Miaojia Yuan et al.
13 citations
Journal of Applied Physics
Ferroelectric and Negative Capacitance Devices
2.71
article

Insights into oxygen vacancy dynamics in HfO2–ZrO2 superlattice ferroelectric films: Implications for device reliability

Runsheng Wang, Yichen Wen, Jinhao Liu, Miaojia Yuan, Pengpeng Ren, Zhigang Ji, Ru Huang, Xuepei Wang, Maokun Wu, Boyao Cui, Ting Zhang, Yishan Wu, S. Ye
article en
13 citations

Abstract

Compared with solid solution (SS) Hf0.5Zr0.5O2, HfO2–ZrO2 superlattice (SL) ferroelectric films exhibit enhanced endurance and reduced leakage. However, so far, the underlying physical mechanism is still missing. In this work, first-principle calculations reveal that the superior reliability arises from the precise control in the spatial profile of oxygen vacancy with the stacked structure in SL in which oxygen vacancies (Vo) exhibit different formation energies and different energy profiles in Zr- and Hf-layers. However, Vo have the tendency to migrate and its suppression become critical to maintain the superiority of SL. A low annealing temperature is, therefore, suggested and validated with our fabricated SL- and SS-ferroelectric films with different annealing temperatures. This understanding can pave ways for the optimization in SL ferroelectric films.

Journal of Applied PhysicsVol. 136(14)
Shanghai Jiao Tong University (CN), Peking University (CN)
National Natural Science Foundation of China
Affordable and clean energy
Openalex Percentile: Top 9%
Ferroelectric and Negative Capacitance Devices
2.71
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Insights into oxygen vacancy dynamics in HfO2–ZrO2 superlattice ferroelectric films: Implications for device reliability — Runsheng Wang, Yichen Wen, et al. · Journal of Applied Physics (2024) | TGRS Research Map | TGRS