Performance Comparison of Antimony with Group III Compounded Semiconductor Based JLTFET

This report deals with the impact of compound semiconductor material where antimony (group V) material has been mixed with group III materials i.e., aluminum, gallium, and indium on junctionless tunnel field-effect transistor (JLTFET). A performance comparison has been done to understand the impact of increasing higher or lower bandgap material on the electrical performance of the device. The comparative analysis has been carried out considering several figures-of-merits like potential distribution profile, bandgap fluctuations, electric field profile, electron concentration, and the transfer characteristics of the device. The report also shows the contour diagram of potential drop and electron concentration distribution along the channel of the device.

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Published
2024-08-08
DOI
https://doi.org/10.1109/icecsp61809.2024.10698254
Primary Topic
Advancements in Semiconductor Devices and Circuit Design
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article
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Performance Comparison of Antimony with Group III Compounded Semiconductor Based JLTFET

Md Akram Ahmad, Pankaj Kumar Sharma, Pankaj Kumar, Aradhana Mohanty et al.
Advancements in Semiconductor Devices and Circuit Design
article

Performance Comparison of Antimony with Group III Compounded Semiconductor Based JLTFET

Md Akram Ahmad, Pankaj Kumar Sharma, Pankaj Kumar, Aradhana Mohanty, Sagar Sagar
article en

Abstract

This report deals with the impact of compound semiconductor material where antimony (group V) material has been mixed with group III materials i.e., aluminum, gallium, and indium on junctionless tunnel field-effect transistor (JLTFET). A performance comparison has been done to understand the impact of increasing higher or lower bandgap material on the electrical performance of the device. The comparative analysis has been carried out considering several figures-of-merits like potential distribution profile, bandgap fluctuations, electric field profile, electron concentration, and the transfer characteristics of the device. The report also shows the contour diagram of potential drop and electron concentration distribution along the channel of the device.

Indian Institute of Technology Dhanbad (IN), Graphic Era University (IN), Vellore Institute of Technology University (IN), National Institute of Technology Srinagar (IN)
Openalex Percentile: Top 85%
Advancements in Semiconductor Devices and Circuit Design
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Performance Comparison of Antimony with Group III Compounded Semiconductor Based JLTFET — Md Akram Ahmad, Pankaj Kumar Sharma, et al. · (2024) | TGRS Research Map | TGRS