Design of Vertical Double Source TFET for Low Power Applications

The design and analysis of a VDSTFET optimized for low power applications are presented in this paper. TFETs have attracted a lot of attention lately because of their ability for resolving problems with energy efficiency in contemporary integrated circuits. But ordinary TFET designs challenge to achieve low off-currents as well as high on-currents, which are essential for low power operations. This work suggests a unique VDS-TFET design that is low power application-optimized in response. By utilizing a vertical channel layout with two source regions, the suggested VDS-TFET design improves carrier injecting performance and electrostatic control. The design provides enhanced efficiency measures, such as steeper sub-threshold slopes, lower leakage currents, and increased oncurrents—all crucial for low power operation— through extensive devices simulations and improvement methodologies.

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Publication Details

Published
2024-08-08
DOI
https://doi.org/10.1109/icecsp61809.2024.10698510
Citations
2
Primary Topic
Advancements in Semiconductor Devices and Circuit Design
Type
article
Field-Weighted Citation Impact
0.42
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article

Design of Vertical Double Source TFET for Low Power Applications

Mandeep Singh, Tarun Chaudhary, Balwinder Raj, Sachin Yadav
2 citations
Advancements in Semiconductor Devices and Circuit Design
0.42
article

Design of Vertical Double Source TFET for Low Power Applications

Mandeep Singh, Tarun Chaudhary, Balwinder Raj, Sachin Yadav
article en
2 citations

Abstract

The design and analysis of a VDSTFET optimized for low power applications are presented in this paper. TFETs have attracted a lot of attention lately because of their ability for resolving problems with energy efficiency in contemporary integrated circuits. But ordinary TFET designs challenge to achieve low off-currents as well as high on-currents, which are essential for low power operations. This work suggests a unique VDS-TFET design that is low power application-optimized in response. By utilizing a vertical channel layout with two source regions, the suggested VDS-TFET design improves carrier injecting performance and electrostatic control. The design provides enhanced efficiency measures, such as steeper sub-threshold slopes, lower leakage currents, and increased oncurrents—all crucial for low power operation— through extensive devices simulations and improvement methodologies.

Affordable and clean energy
Openalex Percentile: Top 37%
Advancements in Semiconductor Devices and Circuit Design
0.42
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