ESD Robustness of Germanium Photodetectors in Advanced Silicon Photonics Technology

A comprehensive ESD robustness study of 5 different Ge photodetectors in advanced Si photonic technology is presented. The measurement results disclose that the main impact on the ESD transient IV characteristics is from the contact location of the anode terminal. Still, the failure mechanisms need to be further clarified by physical failure analysis as a part of the future work.

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Publication Details

Published
2024-09-16
DOI
https://doi.org/10.23919/eos/esd61719.2024.10702103
Primary Topic
Semiconductor Quantum Structures and Devices
Type
article
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article

ESD Robustness of Germanium Photodetectors in Advanced Silicon Photonics Technology

Wen-Chieh Chen, Shih‐Hung Chen, K. Croes, Yuseok Ban et al.
Semiconductor Quantum Structures and Devices
article

ESD Robustness of Germanium Photodetectors in Advanced Silicon Photonics Technology

Wen-Chieh Chen, Shih‐Hung Chen, K. Croes, Yuseok Ban, Solomon Musibau, P. P. Absil, Kuo-Hsing Kao, Myriam Van De Peer, Artemisia Tsiara, K. Serbulova, Joris Van Campenhout, Marko Simicic, P.-Y. Fu
article en

Abstract

A comprehensive ESD robustness study of 5 different Ge photodetectors in advanced Si photonic technology is presented. The measurement results disclose that the main impact on the ESD transient IV characteristics is from the contact location of the anode terminal. Still, the failure mechanisms need to be further clarified by physical failure analysis as a part of the future work.

IMEC (BE), National Cheng Kung University (TW), KU Leuven (BE)
Industry, innovation and infrastructure
Openalex Percentile: Top 84%
Semiconductor Quantum Structures and Devices
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