Characterization and modeling of the mobility, threshold voltage, and subthreshold swing in p-GaN gate HEMTs at cryogenic temperatures

This study presents a comprehensive investigation of the electrical properties of p-GaN gate HEMT devices under cryogenic operations, spanning a temperature range from 300 K all the way down to 10 K. We report achievement of a low sub-60 mV/dec sub-threshold swing (SS) (33.2 mV/dec at 10 K), a high ION/IOFF ratio (∼3.5 × 1010 at 10 K), and a remarkable ID,max (∼358 mA/mm at 10 K) in p-GaN gate HEMTs operating under cryogenic conditions. Furthermore, the mobility, threshold voltage shifts, and SS characteristics at cryogenic temperatures are modeled in p-GaN HEMTs. In summary, p-GaN gate HEMTs are promising for cryogenic applications due to their low SS, high gm,max, impressive ION/IOFF ratio, and substantial ID,max. Furthermore, the modeling achieved in this work can pave the way for future characteristic prediction in p-GaN HEMTs at cryogenic temperatures.

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Publication Details

Journal
Applied Physics Letters
Published
2024-10-07
DOI
https://doi.org/10.1063/5.0223576
Citations
10
Primary Topic
GaN-based semiconductor devices and materials
Type
article
Field-Weighted Citation Impact
3.11

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article

Characterization and modeling of the mobility, threshold voltage, and subthreshold swing in p-GaN gate HEMTs at cryogenic temperatures

Tian‐Li Wu, Yogesh Singh Chauhan, Shivendra Singh, Thien Sao Ngo
10 citations
Applied Physics Letters
GaN-based semiconductor devices and materials
3.11
article

Characterization and modeling of the mobility, threshold voltage, and subthreshold swing in p-GaN gate HEMTs at cryogenic temperatures

Tian‐Li Wu, Yogesh Singh Chauhan, Shivendra Singh, Thien Sao Ngo
article en
10 citations

Abstract

This study presents a comprehensive investigation of the electrical properties of p-GaN gate HEMT devices under cryogenic operations, spanning a temperature range from 300 K all the way down to 10 K. We report achievement of a low sub-60 mV/dec sub-threshold swing (SS) (33.2 mV/dec at 10 K), a high ION/IOFF ratio (∼3.5 × 1010 at 10 K), and a remarkable ID,max (∼358 mA/mm at 10 K) in p-GaN gate HEMTs operating under cryogenic conditions. Furthermore, the mobility, threshold voltage shifts, and SS characteristics at cryogenic temperatures are modeled in p-GaN HEMTs. In summary, p-GaN gate HEMTs are promising for cryogenic applications due to their low SS, high gm,max, impressive ION/IOFF ratio, and substantial ID,max. Furthermore, the modeling achieved in this work can pave the way for future characteristic prediction in p-GaN HEMTs at cryogenic temperatures.

Applied Physics LettersVol. 125(15)
National Yang Ming Chiao Tung University (TW), Hodges University (US), Indian Institute of Technology Kanpur (IN)
Ministry of Education
Openalex Percentile: Top 7%
GaN-based semiconductor devices and materials
3.11
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Characterization and modeling of the mobility, threshold voltage, and subthreshold swing in p-GaN gate HEMTs at cryogenic temperatures — Tian‐Li Wu, Yogesh Singh Chauhan, et al. · Applied Physics Letters (2024) | TGRS Research Map | TGRS