Characterization and modeling of the mobility, threshold voltage, and subthreshold swing in p-GaN gate HEMTs at cryogenic temperatures
This study presents a comprehensive investigation of the electrical properties of p-GaN gate HEMT devices under cryogenic operations, spanning a temperature range from 300 K all the way down to 10 K. We report achievement of a low sub-60 mV/dec sub-threshold swing (SS) (33.2 mV/dec at 10 K), a high ION/IOFF ratio (∼3.5 × 1010 at 10 K), and a remarkable ID,max (∼358 mA/mm at 10 K) in p-GaN gate HEMTs operating under cryogenic conditions. Furthermore, the mobility, threshold voltage shifts, and SS characteristics at cryogenic temperatures are modeled in p-GaN HEMTs. In summary, p-GaN gate HEMTs are promising for cryogenic applications due to their low SS, high gm,max, impressive ION/IOFF ratio, and substantial ID,max. Furthermore, the modeling achieved in this work can pave the way for future characteristic prediction in p-GaN HEMTs at cryogenic temperatures.
Authors
- Tian‐Li Wu (ORCID: https://orcid.org/0000-0001-6788-5470)
- Yogesh Singh Chauhan (ORCID: https://orcid.org/0000-0002-3356-8917)
- Shivendra Singh (ORCID: https://orcid.org/0000-0001-6977-8767)
- Thien Sao Ngo (ORCID: https://orcid.org/0000-0002-9880-8205)
Institutions
- National Yang Ming Chiao Tung University (TW)
- Hodges University (US)
- Indian Institute of Technology Kanpur (IN)
Publication Details
- Journal
- Applied Physics Letters
- Published
- 2024-10-07
- DOI
- https://doi.org/10.1063/5.0223576
- Citations
- 10
- Primary Topic
- GaN-based semiconductor devices and materials
- Type
- article
- Field-Weighted Citation Impact
- 3.11
Funders
- Ministry of Education