Evolution of Point Defects in Chip-Level Silicon-Based MOSFET Under Transmission Line Pulse Stress

In this study, the electrical performance and evolution of point defects in chip-level Silicon-based MOSFET under transmission line pulse (TLP) stress were investigated. The experimental results show that the threshold voltage decreased by 9.8%, and the output saturation current increased by 5.9% after the stress. An intrinsic point defect with an energy level of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$0.25~\pm ~0.05$ </tex-math></inline-formula> eV in Si-based MOSFET chips was observed by using deep-level transient spectroscopy (DLTS), which shifted to <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$0.37~\pm ~0.05$ </tex-math></inline-formula> eV after the stress. The increase of the trap energy level would reduce the holes at the Si/SiO2 interface, and herein the threshold voltage reduced. This work helps to further understand the evolution of point defects in Si-based MOSFET chips.