X-Band Bulk Acoustic Wave Resonators With High Figure of Merit Based on Al₀.₈Sc₀.₂N

Bulk Acoustic Wave (BAW) resonators encounter two significant challenges in the super high frequency (SHF) band. Firstly, the thicknesses of the piezoelectric layer and electrodes within the resonator are markedly reduced. This dimensional constraint results in a diminished electromechanical coupling coefficient (Kt2). Secondly, the quality factor (Q) of the resonator deteriorates at SHF frequencies. The Kt2 can be enhanced through Sc doping. However, the introduction of Sc can degrade the quality of the piezoelectric layer material. In this study, Metal-Organic Chemical Vapor Deposition (MOCVD) is employed to deposit an AlN buffer layer, which is subsequently augmented using Physical Vapor Deposition (PVD) to achieve Al0.8Sc0.2N with exceptionally high crystalline quality. Utilizing a 6-inch single-crystalline AlN Bulk Acoustic Resonator (SABAR) fabrication process, we successfully develop an X-band BAW resonator. The resonator exhibits a Kt2 of 6.84%, a quality factor (Q) of 1245, and a figure of merit (FOM) of 84, demonstrating a significant advancement in the performance metrics of BAW resonators in the X band.

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Publication Details

Journal
IEEE Electron Device Letters
Published
2024-10-07
DOI
https://doi.org/10.1109/led.2024.3474733
Citations
4
Primary Topic
Acoustic Wave Resonator Technologies
Type
article
Field-Weighted Citation Impact
0.74

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article

X-Band Bulk Acoustic Wave Resonators With High Figure of Merit Based on Al₀.₈Sc₀.₂N

Tianyou Luo, Yuhan Zhu, Xinyan Yi, Yinuo Zhang et al.
4 citations
IEEE Electron Device Letters
Acoustic Wave Resonator Technologies
0.74
article

X-Band Bulk Acoustic Wave Resonators With High Figure of Merit Based on Al₀.₈Sc₀.₂N

Tianyou Luo, Yuhan Zhu, Xinyan Yi, Yinuo Zhang, Guoqiang Li
article en
4 citations

Abstract

Bulk Acoustic Wave (BAW) resonators encounter two significant challenges in the super high frequency (SHF) band. Firstly, the thicknesses of the piezoelectric layer and electrodes within the resonator are markedly reduced. This dimensional constraint results in a diminished electromechanical coupling coefficient (Kt2). Secondly, the quality factor (Q) of the resonator deteriorates at SHF frequencies. The Kt2 can be enhanced through Sc doping. However, the introduction of Sc can degrade the quality of the piezoelectric layer material. In this study, Metal-Organic Chemical Vapor Deposition (MOCVD) is employed to deposit an AlN buffer layer, which is subsequently augmented using Physical Vapor Deposition (PVD) to achieve Al0.8Sc0.2N with exceptionally high crystalline quality. Utilizing a 6-inch single-crystalline AlN Bulk Acoustic Resonator (SABAR) fabrication process, we successfully develop an X-band BAW resonator. The resonator exhibits a Kt2 of 6.84%, a quality factor (Q) of 1245, and a figure of merit (FOM) of 84, demonstrating a significant advancement in the performance metrics of BAW resonators in the X band.

IEEE Electron Device LettersVol. 45(12)
Guangzhou Electronic Technology (China) (CN), South China University of Technology (CN)
National Key Research and Development Program of China
Openalex Percentile: Top 32%
Acoustic Wave Resonator Technologies
0.74
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