Improving Doping Efficiency of Mist-CVD Epitaxy for Tin-Doped α-Ga₂O₃ Using Tin Chloride Pentahydrate
Tin chloride pentahydrate (SnCl<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${_{{4}}} \cdot 5$ </tex-math></inline-formula> H2O) is used as the dopant precursor to form the n-type <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\alpha $ </tex-math></inline-formula>-Ga2O3 in this study. The X-ray diffraction (XRD) and high-resolution transmission electron microscope (HR-TEM) confirm that the single-crystalline <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\alpha $ </tex-math></inline-formula>-Ga2O3:SnCl<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${_{{4}}} \cdot 5$ </tex-math></inline-formula> H2O epi-layer was grown on the r-plane sapphire substrate using mist chemical vapor deposition (mist-CVD). When the Sn doping atomic concentrations are the same, the electron concentration of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\alpha $ </tex-math></inline-formula>-Ga2O3:SnCl<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${_{{4}}} \cdot 5$ </tex-math></inline-formula> H2O is higher than that of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\alpha $ </tex-math></inline-formula>-Ga2O3:SnCl<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${_{{2}}} \cdot 2$ </tex-math></inline-formula> H2O. The lower thermal decomposition temperature and lower residues of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\alpha $ </tex-math></inline-formula>-Ga2O3:SnCl<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${_{{4}}} \cdot 5$ </tex-math></inline-formula> H2O are confirmed in thermogravimetric (TGA) analysis. Sn <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$3d_{5/2}$ </tex-math></inline-formula> binding energy spectra observed by X-ray photoelectron spectroscopy (XPS) show that SnCl<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${_{{4}}} \cdot 5$ </tex-math></inline-formula> H2O provides more <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$Sn^{4+}$ </tex-math></inline-formula> than SnCl<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${_{{2}}} \cdot 2$ </tex-math></inline-formula> H2O. The specific contact resistivity of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\alpha $ </tex-math></inline-formula>-Ga2O3:SnCl<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${_{{4}}} \cdot 5$ </tex-math></inline-formula> H2O reaches <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$1.62\times 10{^{-}5 }~\Omega $ </tex-math></inline-formula>-cm2 with <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$10^{20}$ </tex-math></inline-formula> cm<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$^{-}3 $ </tex-math></inline-formula> Sn doping concentration. Moreover, the power figure-of-merit (PFoM) of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\alpha $ </tex-math></inline-formula>-Ga2O3:SnCl<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${_{{4}}} \cdot 5$ </tex-math></inline-formula> H2O-based lateral Schottky barrier diode (SBD) is 0.356 GW/cm2 which is comparable to <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\beta $ </tex-math></inline-formula>-Ga2O3-based SBD.
Authors
- Yun-Yun Cheng
- Han-Yin Liu (ORCID: https://orcid.org/0000-0003-1150-7192)
- Wei-Han Chen (ORCID: https://orcid.org/0000-0002-0395-1018)
- Ko-Fan Hu
- Nei-En Chiu
Institutions
- National Sun Yat-sen University (TW)
Publication Details
- Journal
- IEEE Transactions on Semiconductor Manufacturing
- Published
- 2024-10-07
- DOI
- https://doi.org/10.1109/tsm.2024.3475730
- Citations
- 5
- Primary Topic
- Ga2O3 and related materials
- Type
- article
- Field-Weighted Citation Impact
- 0.59