Improving Doping Efficiency of Mist-CVD Epitaxy for Tin-Doped α-Ga₂O₃ Using Tin Chloride Pentahydrate

Tin chloride pentahydrate (SnCl<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${_{{4}}} \cdot 5$ </tex-math></inline-formula> H2O) is used as the dopant precursor to form the n-type <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\alpha $ </tex-math></inline-formula>-Ga2O3 in this study. The X-ray diffraction (XRD) and high-resolution transmission electron microscope (HR-TEM) confirm that the single-crystalline <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\alpha $ </tex-math></inline-formula>-Ga2O3:SnCl<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${_{{4}}} \cdot 5$ </tex-math></inline-formula> H2O epi-layer was grown on the r-plane sapphire substrate using mist chemical vapor deposition (mist-CVD). When the Sn doping atomic concentrations are the same, the electron concentration of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\alpha $ </tex-math></inline-formula>-Ga2O3:SnCl<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${_{{4}}} \cdot 5$ </tex-math></inline-formula> H2O is higher than that of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\alpha $ </tex-math></inline-formula>-Ga2O3:SnCl<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${_{{2}}} \cdot 2$ </tex-math></inline-formula> H2O. The lower thermal decomposition temperature and lower residues of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\alpha $ </tex-math></inline-formula>-Ga2O3:SnCl<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${_{{4}}} \cdot 5$ </tex-math></inline-formula> H2O are confirmed in thermogravimetric (TGA) analysis. Sn <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$3d_{5/2}$ </tex-math></inline-formula> binding energy spectra observed by X-ray photoelectron spectroscopy (XPS) show that SnCl<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${_{{4}}} \cdot 5$ </tex-math></inline-formula> H2O provides more <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$Sn^{4+}$ </tex-math></inline-formula> than SnCl<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${_{{2}}} \cdot 2$ </tex-math></inline-formula> H2O. The specific contact resistivity of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\alpha $ </tex-math></inline-formula>-Ga2O3:SnCl<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${_{{4}}} \cdot 5$ </tex-math></inline-formula> H2O reaches <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$1.62\times 10{^{-}5 }~\Omega $ </tex-math></inline-formula>-cm2 with <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$10^{20}$ </tex-math></inline-formula> cm<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$^{-}3 $ </tex-math></inline-formula> Sn doping concentration. Moreover, the power figure-of-merit (PFoM) of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\alpha $ </tex-math></inline-formula>-Ga2O3:SnCl<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${_{{4}}} \cdot 5$ </tex-math></inline-formula> H2O-based lateral Schottky barrier diode (SBD) is 0.356 GW/cm2 which is comparable to <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\beta $ </tex-math></inline-formula>-Ga2O3-based SBD.

Authors

Institutions

Publication Details

Journal
IEEE Transactions on Semiconductor Manufacturing
Published
2024-10-07
DOI
https://doi.org/10.1109/tsm.2024.3475730
Citations
5
Primary Topic
Ga2O3 and related materials
Type
article
Field-Weighted Citation Impact
0.59
Controls
|||
ALL TIME
JAN
FEB
MAR
APR
MAY
JUN
JUL
AUG
SEP
OCT
article

Improving Doping Efficiency of Mist-CVD Epitaxy for Tin-Doped α-Ga₂O₃ Using Tin Chloride Pentahydrate

Yun-Yun Cheng, Han-Yin Liu, Wei-Han Chen, Ko-Fan Hu et al.
5 citations
IEEE Transactions on Semiconductor Manufacturing
Ga2O3 and related materials
0.59
article

Improving Doping Efficiency of Mist-CVD Epitaxy for Tin-Doped α-Ga₂O₃ Using Tin Chloride Pentahydrate

Yun-Yun Cheng, Han-Yin Liu, Wei-Han Chen, Ko-Fan Hu, Nei-En Chiu
article en
5 citations

Abstract

Tin chloride pentahydrate (SnCl<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${_{{4}}} \cdot 5$ </tex-math></inline-formula> H2O) is used as the dopant precursor to form the n-type <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\alpha $ </tex-math></inline-formula>-Ga2O3 in this study. The X-ray diffraction (XRD) and high-resolution transmission electron microscope (HR-TEM) confirm that the single-crystalline <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\alpha $ </tex-math></inline-formula>-Ga2O3:SnCl<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${_{{4}}} \cdot 5$ </tex-math></inline-formula> H2O epi-layer was grown on the r-plane sapphire substrate using mist chemical vapor deposition (mist-CVD). When the Sn doping atomic concentrations are the same, the electron concentration of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\alpha $ </tex-math></inline-formula>-Ga2O3:SnCl<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${_{{4}}} \cdot 5$ </tex-math></inline-formula> H2O is higher than that of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\alpha $ </tex-math></inline-formula>-Ga2O3:SnCl<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${_{{2}}} \cdot 2$ </tex-math></inline-formula> H2O. The lower thermal decomposition temperature and lower residues of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\alpha $ </tex-math></inline-formula>-Ga2O3:SnCl<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${_{{4}}} \cdot 5$ </tex-math></inline-formula> H2O are confirmed in thermogravimetric (TGA) analysis. Sn <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$3d_{5/2}$ </tex-math></inline-formula> binding energy spectra observed by X-ray photoelectron spectroscopy (XPS) show that SnCl<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${_{{4}}} \cdot 5$ </tex-math></inline-formula> H2O provides more <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$Sn^{4+}$ </tex-math></inline-formula> than SnCl<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${_{{2}}} \cdot 2$ </tex-math></inline-formula> H2O. The specific contact resistivity of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\alpha $ </tex-math></inline-formula>-Ga2O3:SnCl<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${_{{4}}} \cdot 5$ </tex-math></inline-formula> H2O reaches <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$1.62\times 10{^{-}5 }~\Omega $ </tex-math></inline-formula>-cm2 with <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$10^{20}$ </tex-math></inline-formula> cm<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$^{-}3 $ </tex-math></inline-formula> Sn doping concentration. Moreover, the power figure-of-merit (PFoM) of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\alpha $ </tex-math></inline-formula>-Ga2O3:SnCl<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${_{{4}}} \cdot 5$ </tex-math></inline-formula> H2O-based lateral Schottky barrier diode (SBD) is 0.356 GW/cm2 which is comparable to <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\beta $ </tex-math></inline-formula>-Ga2O3-based SBD.

IEEE Transactions on Semiconductor ManufacturingVol. 37(4)
National Sun Yat-sen University (TW)
Openalex Percentile: Top 39%
Ga2O3 and related materials
0.59
AI Navigator

Ask Laika to Summarize, Analyze, and Connect papers live on the map.

Summarize Papers & Methodologies

Extract key findings, datasets, and comparative methods across publications.

Benchmark Rankings & Visual Analytics

Rank top research institutions, authors, funders, topics, and journals by Field-Weighted Citation Impact (FWCI) and paper volume with instant charts.

Connect Distant Disciplines

Bridge topological clusters on the map to find hidden collaborative intersections.