InP-based strain engineered InAs(Sb)/InAsPSb multiple quantum wells with tunable emission and high internal quantum efficiency enabled by Sb incorporation

A type I InAs(Sb)/InAsPSb strain engineered multiple quantum wells light emitting diodes system has been demonstrated. Tensile InAsPSb quantum barriers with a high degree of band offset (∆EC = 116–123 meV, ∆EV = 193–250 meV) were used to compensate for the high compressive strain of the InAs(Sb) quantum wells. The structure was grown on the n+-InAsxP1−x metamorphic buffer with a high degree of relaxation (98%), low surface roughness (0.69 nm), and low dislocation density. Through careful strain engineering design, the compressive strain of InAs(Sb) reaches 0.57%–1.52% without strain relaxation. The incorporation of Sb into the multiple quantum wells not only reduces the bandgap but also improves the interface quality by acting as an effective surfactant. Structural analysis reveals superior quality in InAsSb/InAsPSb multiple quantum wells compared to InAs/InAsPSb multiple quantum wells, demonstrating significantly reduced interface roughness and suppression of the Stranski–Krastanov growth mode. Room temperature electroluminescence measurements show a tunable emission wavelength ranging from 2.7 to 3.3 μm, accompanied by a narrow full width at half maximum value of 45 meV. Photoluminescence analysis indicates that the internal quantum efficiency of InAsSb/InAsPSb multiple quantum wells is 5.5%, which is 7 times higher than that of InAs/InAsPSb.