Effect of current density on the microstructure and properties of supercritical Ni-FG composite electrodeposited layers

This study investigates the surface morphology and microstructure of nickel (Ni) plating and nickel-fluorinated graphene (Ni-FG) composite plating, both produced using a direct current (DC) power supply under standard and supercritical conditions. The findings reveal that the Ni-FG composite plating created under supercritical conditions can incorporate more fluorinated graphene (FG), with the carbon content reaching 0.727 wt%, surpassing the 0.155 wt% found in the plating produced by conventional electrodeposition. The supercritical plating also exhibits improved surface morphology, characterized by a smooth, defect-free surface. The grain size of the plating is notably smaller, averaging 7.39 nm, which is a reduction of over 59.6% compared to other plated layers, with grains predominantly oriented towards the (111) texture. The study focuses on comparing the surface morphology, microstructure, mechanical properties, and electrochemical characteristics of Ni-FG composite plating prepared at various current densities. Results indicate that at a current density of 5 A/dm 2 , the Ni-FG composite plating displays an exceptionally refined grain structure, with an average grain size of 7.39 nm. This plating layer exhibits excellent wear resistance, with a microhardness value of 772.2 HV 0.2 , a low coefficient of friction of 0.17, and a minimal wear volume of 1.890 × 10 7 μm 3 . Furthermore, the coatings produced at this current density exhibit exceptional corrosion resistance, as indicated by a film resistance (R coat ) of 13,850 Ω·cm 2 and an interface resistance (R ct ) of 10.96 × 10 4 Ω·cm 2 during the electrode oxidation process.

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Publication Details

Journal
Journal of Materials Research and Technology
Published
2024-10-05
DOI
https://doi.org/10.1016/j.jmrt.2024.09.260
Citations
1
Primary Topic
Electrodeposition and Electroless Coatings
Type
article
Field-Weighted Citation Impact
0.21

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article

Effect of current density on the microstructure and properties of supercritical Ni-FG composite electrodeposited layers

Tianle Xv, Bin He, Weining Lei, Mengqi Cong et al.
1 citations
Journal of Materials Research and Technology
Electrodeposition and Electroless Coatings
0.21
article

Effect of current density on the microstructure and properties of supercritical Ni-FG composite electrodeposited layers

Tianle Xv, Bin He, Weining Lei, Mengqi Cong, Haoyu Zhong
article en
1 citations

Abstract

This study investigates the surface morphology and microstructure of nickel (Ni) plating and nickel-fluorinated graphene (Ni-FG) composite plating, both produced using a direct current (DC) power supply under standard and supercritical conditions. The findings reveal that the Ni-FG composite plating created under supercritical conditions can incorporate more fluorinated graphene (FG), with the carbon content reaching 0.727 wt%, surpassing the 0.155 wt% found in the plating produced by conventional electrodeposition. The supercritical plating also exhibits improved surface morphology, characterized by a smooth, defect-free surface. The grain size of the plating is notably smaller, averaging 7.39 nm, which is a reduction of over 59.6% compared to other plated layers, with grains predominantly oriented towards the (111) texture. The study focuses on comparing the surface morphology, microstructure, mechanical properties, and electrochemical characteristics of Ni-FG composite plating prepared at various current densities. Results indicate that at a current density of 5 A/dm 2 , the Ni-FG composite plating displays an exceptionally refined grain structure, with an average grain size of 7.39 nm. This plating layer exhibits excellent wear resistance, with a microhardness value of 772.2 HV 0.2 , a low coefficient of friction of 0.17, and a minimal wear volume of 1.890 × 10 7 μm 3 . Furthermore, the coatings produced at this current density exhibit exceptional corrosion resistance, as indicated by a film resistance (R coat ) of 13,850 Ω·cm 2 and an interface resistance (R ct ) of 10.96 × 10 4 Ω·cm 2 during the electrode oxidation process.

Journal of Materials Research and TechnologyVol. 33
Jiangsu University of Technology (CN), Institute of Advanced Manufacturing Technology (CN)
National Natural Science Foundation of China, Jiangsu University of Technology
Openalex Percentile: Top 47%
Electrodeposition and Electroless Coatings
0.21
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