Effect of Annealing Temperature on Structural And Optical Properties of Thin Films

SnO2 thin films were prepared by DC magnetron sputtering technique on glass substrates at 200 ℃ temperature. Both an X-ray diffractometer and a UV/VIS spectrophotometer were used to examine how the annealing temperature affected the structural and optical characteristics of the films. X-ray diffraction patterns indicated that the SnO2 films showed a polycrystalline tetragonal structure. The optical properties and dispersion parameters of the films have been studied over a wavelength (300-900) nm. A high optical energy-gap of 3.72 eV was achieved at temperature 400 ℃. Many optical parameters such as refractive index, dielectric constant, ratio of carrier concentration to the effective mass, single oscillator energy, dispersive energy, moments of the optical spectrum, the average operator strength, single operator wavelength, optical resistivity, thermal emission, and optical conductivity parameters were determined and examined in relation to the annealing temperature.