Performance Parameters of Microstrip Antennas under Different Plasma Distributions

The input impedance of the antenna will change due to the plasmas around the antenna, which will lead to the change of antenna resonance point, return loss and other performance parameters. In this paper, the interaction model between microstrip antenna and non-uniform cylindrical plasmas was established to analyze the effects of different plasma distributions on the performance parameters of microstrip antenna. Results indicate that under the three electron density distributions of Gaussian, linear and exponential distribution, the voltage standing wave ratio (VSWR) of microstrip antenna increases to different degrees, and the antenna pattern also attenuates to different degrees. The variation degree of performance parameters is related to the electron density distribution.