Parametric modeling and deposition control of diffuse-reflectance spectra for NIR-SWIR absorbing dyes on substrates based on surface topology

This study examines parametric modeling and deposition control of diffuse reflectance for NIR-SWIR absorbing dyes on substrates, which is based on diffuse-reflectance theory and decomposition of the reflectance function by linear combinations of segmented reflectance contributions. The segmented reflectance contributions are distributed upon substrate surfaces according to different topologies. Parametric modeling of diffuse reflectance provides an approach for the control of a wide range of signature features associated with NIR-SWIR absorbing dyes on substrates. The dependence on the surface topology of diffuse-reflectance spectra for NIR-SWIR absorbing dyes on substrates is examined by case studies concerning composite-material layers on fabric substrates. Understanding the topological dependence of diffuse reflectance can assist in determining optimal composite-material configurations for specific reflectance specifications.