Analysis of laser-induced contamination in the sub-picosecond UV regime and its consequences on laser beam quality in the context of industrial applications

Authors

Jules Herbuvaux
Julien Nillon
Serge Monneret (ORCID: https://orcid.org/0000-0002-3093-9161)
Laurent Gallais (ORCID: https://orcid.org/0000-0002-6806-4313)
Luis Alonso Vazquez-Zuniga
Clemens Hoenninger
Frank Wagner (ORCID: https://orcid.org/0000-0003-4837-483X)

Institutions

Institut Fresnel (FR)
Amplitude Systèmes (France) (FR)

Publication Details

Published: 2024-10-02
DOI: https://doi.org/10.1117/12.3032734
Primary Topic: Ocular and Laser Science Research
Type: article
Field-Weighted Citation Impact: 0.00

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article

Analysis of laser-induced contamination in the sub-picosecond UV regime and its consequences on laser beam quality in the context of industrial applications

Jules Herbuvaux, Julien Nillon, Serge Monneret, Laurent Gallais et al.

Oct 2, 2024

Ocular and Laser Science Research

article

Analysis of laser-induced contamination in the sub-picosecond UV regime and its consequences on laser beam quality in the context of industrial applications

Jules Herbuvaux, Julien Nillon, Serge Monneret, Laurent Gallais, Luis Alonso Vazquez-Zuniga, Clemens Hoenninger, Frank Wagner

October 2, 2024article en

Abstract

No abstract available for this paper.

Institut Fresnel (FR), Amplitude Systèmes (France) (FR)

Openalex Percentile: Top 71%

Ocular and Laser Science Research

DOI Open Access PDF OpenAlex

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Analysis of laser-induced contamination in the sub-picosecond UV regime and its consequences on laser beam quality in the context of industrial applications — Jules Herbuvaux, Julien Nillon, et al. · (2024) | TGRS Research Map | TGRS