A Simulation Study on the Effect of Filament Spacing on the Temperature Field Uniformity of an HFCVD System

Hot-filament chemical vapor deposition (HFCVD) has become the most widely used ways of preparing diamond film-coated tools due to the simple equipment used, its convenient operation, and its low cost. In the production process of an actual factory, a large number of coated tools need to be prepared in batches. Factors such as the hot-filament arrangement often affect the uniformity of coating on tools, making the performance of the tools prepared in the same batch unstable. This article uses ANSYS R15.0 software software in the context of computational fluid dynamics (CFD) to calculate the temperature field in the HFCVD system, and study the effect of filament spacing on the uniformity of the temperature field of the surface of the substrate. It was found that when the distance between filaments was 14 mm, 10 mm, 10 mm, 8 mm, 8 mm, the temperature field on the surface of the substrate was the most uniform. The experiments are consistent with the results of the simulation, indicating that simulation research has practical significance.