Quantum holographic eraser using metasurface

A conventional quantum eraser involves physical double slits or virtual paths, such as orbital angular momentum, and has been demonstrated to probe the wave-particle duality of light in the quantum optical regime. Here, we extend the concept of the quantum eraser to holographic applications through a geometric-phase metasurface. In this case, we mark hologram paths with polarization using an entangled photon pair. As a result of a quantum holographic eraser, we demonstrate selective erasure of specific hologram regions with various inserted erasers as a visual manifestation of restoring interference. Our work extends the application of metasurfaces in investigating fundamental concepts, including entanglement, non-locality, and the role of information in quantum optics.

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Publication Details

Published
2024-10-02
DOI
https://doi.org/10.1117/12.3028051
Primary Topic
Near-Field Optical Microscopy
Type
article
Field-Weighted Citation Impact
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article

Quantum holographic eraser using metasurface

Jensen Li, Hong Liang, Wai Chun Wong, Tailin An
Near-Field Optical Microscopy
article

Quantum holographic eraser using metasurface

Jensen Li, Hong Liang, Wai Chun Wong, Tailin An
article en

Abstract

A conventional quantum eraser involves physical double slits or virtual paths, such as orbital angular momentum, and has been demonstrated to probe the wave-particle duality of light in the quantum optical regime. Here, we extend the concept of the quantum eraser to holographic applications through a geometric-phase metasurface. In this case, we mark hologram paths with polarization using an entangled photon pair. As a result of a quantum holographic eraser, we demonstrate selective erasure of specific hologram regions with various inserted erasers as a visual manifestation of restoring interference. Our work extends the application of metasurfaces in investigating fundamental concepts, including entanglement, non-locality, and the role of information in quantum optics.

Hong Kong University of Science and Technology (HK)
Openalex Percentile: Top 85%
Near-Field Optical Microscopy
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