Plasmonic nano-disks arrays made with electron beam lithography using the dots-on-the-fly method

Plasmonics and metamaterials have attracted considerable attention over the past decade, owing to the revolutionary impacts that they bring to both fundamental physics and practical applications in multiple disciplines. These structures are routinely patterned by Electron Beam Lithography (EBL). For practical application, a large surface area coverage by uniform nanostructures is required. Therefore, accelerating EBL patterning speed for these structures will pave the way toward more practical applications. We present a fast fabrication of arrays of plasmonic nano-disks with quality factors ~ 30 using the dots-on-the-fly EBL.