Exploring surface plasmon nanolaser applications with substrate-free fabrication method

Laser applications in advanced micro/nanoscale technology have traditionally been constrained by the diffraction limit, restricting lasers from achieving nanoscale dimensions. This study introduces an innovative method utilizing a semiconductor-insulator-metal (SIM) structure to fabricate substrate-free surface plasmon polariton (SPP) lasers. This novel design not only substantially reduces the device footprint but also decreases the laser threshold, thereby improving the electromagnetic field confinement. By eliminating the need for a substrate, our approach potentially enhances the integration of micro/nanoscale technologies. This advancement represents a significant step forward in the development of compact and efficient optoelectronic devices, offering new opportunities for innovation across various scientific and engineering fields.