Tuning plasma chemistry by various excitation mechanisms for the <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"> <mml:mrow> <mml:mrow> <mml:msub> <mml:mi>H</mml:mi> <mml:mn>2</mml:mn> </mml:msub> <mml:msub> <mml:mi>O</mml:mi> <mml:mn>2</mml
Abstract Atmospheric pressure plasmas (APPJs) are widely used for research purposes or industrial applications. There are plenty of different APPJs designed with various geometries and excitation frequencies ranging from kHz over RF (MHz) to fast ns pulses. A direct comparison of these APPJs is often challenging as the different geometries or the different excitation frequencies are not the same and can strongly influence plasma behaviour. In this work, this challenge is met and overcome by the use of an APPJ which can be operated at various excitation frequencies. kHz pulsing with a high voltage peak with µ s rise time, sinusoidal voltage pulse at 13.56 MHz and fast high voltage ns pulse were applied to the plasma jet used. The production of <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" overflow="scroll"> <mml:mrow> <mml:mrow> <mml:msub> <mml:mi mathvariant="normal">H</mml:mi> <mml:mn>2</mml:mn> </mml:msub> <mml:msub> <mml:mi mathvariant="normal">O</mml:mi> <mml:mn>2</mml:mn> </mml:msub> </mml:mrow> </mml:mrow> </mml:math> was investigated by treating liquids and measuring the <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" overflow="scroll"> <mml:mrow> <mml:mrow> <mml:msub> <mml:mi mathvariant="normal">H</mml:mi> <mml:mn>2</mml:mn> </mml:msub> <mml:msub> <mml:mi mathvariant="normal">O</mml:mi> <mml:mn>2</mml:mn> </mml:msub> </mml:mrow> </mml:mrow> </mml:math> concentration in the treated liquid. Fast ns pulses and RF excitation show similar results, while the kHz excitation is less effective in the <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" overflow="scroll"> <mml:mrow> <mml:mrow> <mml:msub> <mml:mi mathvariant="normal">H</mml:mi> <mml:mn>2</mml:mn> </mml:msub> <mml:msub> <mml:mi mathvariant="normal">O</mml:mi> <mml:mn>2</mml:mn> </mml:msub> </mml:mrow> </mml:mrow> </mml:math> production.
Authors
- Judith Golda (ORCID: https://orcid.org/0000-0003-2344-2146)
- Steffen Schüttler
- Niklas Eichstaedt
Institutions
- Ruhr University Bochum (DE)
Publication Details
- Journal
- Journal of Physics D Applied Physics
- Published
- 2024-09-30
- DOI
- https://doi.org/10.1088/1361-6463/ad816a
- Citations
- 5
- Primary Topic
- Plasma Applications and Diagnostics
- Type
- article
- Field-Weighted Citation Impact
- 2.02
Funders
- Deutsche Forschungsgemeinschaft