Fractional Talbot Lithography for Predesigned Large-Area Liquid-Crystal Alignment

To address the increasing demands for cost-effective, large-area, and precisely patterned alignment of liquid crystals, a fractional Talbot lithography alignment technique was proposed. A light intensity distribution with a double spatial frequency of a photomask could be achieved based on the fractional Talbot effect, which not only enhanced the resolution of lithography but also slashed system costs with remarkable efficiency. To verify the feasibility of the alignment method, we prepared a one-dimensional polymer grating as an alignment layer. A uniform alignment over a large area was achieved thanks to the perfect periodicity and groove depth of several hundred nanometers. The anchoring energy of the alignment layer was 1.82 × 10^-4 J/m², measured using the twist balance method, which surpassed that of conventional rubbing alignment. Furthermore, to demonstrate its ability for non-uniform alignment, we prepared polymer concentric rings as an alignment layer, resulting in a liquid-crystal <i>q</i>-plate with <i>q</i> = 1 and α0 = π/2. This device, with a wide tuning range (phase retardation of ~6π @ 633 nm for 0 to 5 V), was used to generate special optical fields. The results demonstrate that this approach allows for the uniform large-area orientation of liquid-crystal molecules with superior anchoring energy and customizable patterned alignment, which has extensive application value in liquid-crystal displays, generating special optical fields and intricate liquid-crystal topological defects over a large area.