Acoustic and optical phonon frequencies and acoustic phonon velocities in Si-doped AlN thin films

We report the results of the study of the acoustic and optical phonons in Si-doped AlN thin films grown by metal–organic chemical vapor deposition on sapphire substrates. The Brillouin–Mandelstam and Raman light scattering spectroscopies were used to measure the acoustic and optical phonon frequencies close to the Brillouin zone center. The optical phonon frequencies reveal non-monotonic changes, reflective of the variations in the thin film strain and dislocation densities with the addition of Si dopant atoms. The acoustic phonon velocity decreases monotonically with increasing Si dopant concentration, reducing by ∼300 m/s at the doping level of 3 × 1019 cm−3. The knowledge of the acoustic phonon velocities can be used for the optimization of the ultra-wide bandgap semiconductor heterostructures and for minimizing the thermal boundary resistance of high-power devices.

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Publication Details

Journal
Applied Physics Letters
Published
2024-09-30
DOI
https://doi.org/10.1063/5.0233163
Citations
7
Primary Topic
GaN-based semiconductor devices and materials
Type
article
Field-Weighted Citation Impact
2.18

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Acoustic and optical phonon frequencies and acoustic phonon velocities in Si-doped AlN thin films

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article

Acoustic and optical phonon frequencies and acoustic phonon velocities in Si-doped AlN thin films

Erick Guzman, Dylan Wright, Houqiang Fu, Dinusha Herath Mudiyanselage, Alexander A. Balandin, Bingcheng Da, Jordan Teeter, Xuke Fu
article en
7 citations

Abstract

We report the results of the study of the acoustic and optical phonons in Si-doped AlN thin films grown by metal–organic chemical vapor deposition on sapphire substrates. The Brillouin–Mandelstam and Raman light scattering spectroscopies were used to measure the acoustic and optical phonon frequencies close to the Brillouin zone center. The optical phonon frequencies reveal non-monotonic changes, reflective of the variations in the thin film strain and dislocation densities with the addition of Si dopant atoms. The acoustic phonon velocity decreases monotonically with increasing Si dopant concentration, reducing by ∼300 m/s at the doping level of 3 × 1019 cm−3. The knowledge of the acoustic phonon velocities can be used for the optimization of the ultra-wide bandgap semiconductor heterostructures and for minimizing the thermal boundary resistance of high-power devices.

Applied Physics LettersVol. 125(14)
California NanoSystems Institute (US), University of California, Los Angeles (US), Arizona State University (US), Auburn University (US)
Division of Materials Research, Basic Energy Sciences
Openalex Percentile: Top 12%
GaN-based semiconductor devices and materials
2.18
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