ReaxFF Molecular Reactive Dynamics on Surface passivation of Al and AlH3

Use density functional theory to fit a ReaxFF reaction force field which is applicable to CHONAl systems. By applying this reaction force field, molecular reactive dynamics on surface permeation of Al and AlH3 are performed. Results show that the thickness of passivation layer of Al and AlH3 are obviously reduced under lower temperature. The thickness of passivation layer of Al is 0.9 nm and 1.5 nm when temperature is 200 K and 400 K, respectively. The passivation layer of AlH3 contain Al(OH)3 of 60% mass fraction at lower temperature, and the Al(OH)3 dehydrates and generates Al2O3 at 400 K).

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Publication Details

Journal
Highlights in Science Engineering and Technology
Published
2024-09-27
DOI
https://doi.org/10.54097/8x406r65
Primary Topic
Ion-surface interactions and analysis
Type
article
Field-Weighted Citation Impact
0.00
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article

ReaxFF Molecular Reactive Dynamics on Surface passivation of Al and AlH3

Jiasheng Shi, Wen‐Ya Wu, Aoning Cao
Highlights in Science Engineering and Technology
Ion-surface interactions and analysis
article

ReaxFF Molecular Reactive Dynamics on Surface passivation of Al and AlH3

Jiasheng Shi, Wen‐Ya Wu, Aoning Cao
article en

Abstract

Use density functional theory to fit a ReaxFF reaction force field which is applicable to CHONAl systems. By applying this reaction force field, molecular reactive dynamics on surface permeation of Al and AlH3 are performed. Results show that the thickness of passivation layer of Al and AlH3 are obviously reduced under lower temperature. The thickness of passivation layer of Al is 0.9 nm and 1.5 nm when temperature is 200 K and 400 K, respectively. The passivation layer of AlH3 contain Al(OH)3 of 60% mass fraction at lower temperature, and the Al(OH)3 dehydrates and generates Al2O3 at 400 K).

Highlights in Science Engineering and TechnologyVol. 117
Clean water and sanitation
Openalex Percentile: Top 82%
Ion-surface interactions and analysis
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ReaxFF Molecular Reactive Dynamics on Surface passivation of Al and AlH3 — Jiasheng Shi, Wen‐Ya Wu, et al. · Highlights in Science Engineering and Technology (2024) | TGRS Research Map | TGRS