(Invited) Selective Wet Etching of Semiconductor Materials by Novel Catalyst-assisted Modes

Since reports in the mid-1990s on metal-induced pitting on a Si surface in microelectronics, much attention has been paid to the positive use of corrosion of a semiconductor surface loaded with a metallic catalyst in solutions, known as metal-assisted chemical etching. This paper describes two novel modes of catalyst-assisted etching. The first involves the formation of nano trenches along the atomic step edges of a Si(111) surface with the help of self-assembled metallic nanowires, enabling the separation of neighboring terraces. The second discusses the science and application of nanocarbon-assisted etching, free from noble metals, of a Ge surface in water.